Chuan-Zhe Zhao, Ya-Juan Cai, Yi-Xing Sun, Ya-Ge Wu, Ke-xiao Sang, Ting Yue, Zi-Hao Yang and Jing-Gang Gai
{"title":"基于丙烯酸酸酐的低收缩碱性可降解 UV 纳米压印光刻胶","authors":"Chuan-Zhe Zhao, Ya-Juan Cai, Yi-Xing Sun, Ya-Ge Wu, Ke-xiao Sang, Ting Yue, Zi-Hao Yang and Jing-Gang Gai","doi":"10.1039/D4NR03291H","DOIUrl":null,"url":null,"abstract":"<p >The shrinkage phenomenon of UV-NIL resists during photocuring is still regarded as an important problem hindering the wide application of UV-NIL technology. Herein, we designed four degradable UV-NIL resists with low volume shrinkage rate based on acrylic anhydride. Acrylate provided quick UV curing ability, and the resists were completely cured under a 365 nm UV light for 10 seconds. The anhydride group provided a degradation ability, causing the cured resists to be completely dissolved in an alkaline developer. Introducing rings in the molecular structure could compensate for volume shrinkage by ring-opening, and the volume shrinkage rate of the resists was below 4%. The cured resists showed good thermal stability with a decomposition temperature higher than 150 °C. The UV-NIL resists demonstrated good pattern replication ability, and distinct patterns with 100 nm resolution were obtained. The prepared UV-NIL resists are expected to play a role in the manufacturing of semiconductors, solar cells, displays, sensors, and other devices in the future.</p>","PeriodicalId":92,"journal":{"name":"Nanoscale","volume":" 2","pages":" 1013-1020"},"PeriodicalIF":5.8000,"publicationDate":"2024-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Low volume shrinkage, alkaline degradable UV nanoimprint lithography resists based on acrylic anhydride\",\"authors\":\"Chuan-Zhe Zhao, Ya-Juan Cai, Yi-Xing Sun, Ya-Ge Wu, Ke-xiao Sang, Ting Yue, Zi-Hao Yang and Jing-Gang Gai\",\"doi\":\"10.1039/D4NR03291H\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p >The shrinkage phenomenon of UV-NIL resists during photocuring is still regarded as an important problem hindering the wide application of UV-NIL technology. Herein, we designed four degradable UV-NIL resists with low volume shrinkage rate based on acrylic anhydride. Acrylate provided quick UV curing ability, and the resists were completely cured under a 365 nm UV light for 10 seconds. The anhydride group provided a degradation ability, causing the cured resists to be completely dissolved in an alkaline developer. Introducing rings in the molecular structure could compensate for volume shrinkage by ring-opening, and the volume shrinkage rate of the resists was below 4%. The cured resists showed good thermal stability with a decomposition temperature higher than 150 °C. The UV-NIL resists demonstrated good pattern replication ability, and distinct patterns with 100 nm resolution were obtained. The prepared UV-NIL resists are expected to play a role in the manufacturing of semiconductors, solar cells, displays, sensors, and other devices in the future.</p>\",\"PeriodicalId\":92,\"journal\":{\"name\":\"Nanoscale\",\"volume\":\" 2\",\"pages\":\" 1013-1020\"},\"PeriodicalIF\":5.8000,\"publicationDate\":\"2024-11-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Nanoscale\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://pubs.rsc.org/en/content/articlelanding/2025/nr/d4nr03291h\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"CHEMISTRY, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nanoscale","FirstCategoryId":"88","ListUrlMain":"https://pubs.rsc.org/en/content/articlelanding/2025/nr/d4nr03291h","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
Low volume shrinkage, alkaline degradable UV nanoimprint lithography resists based on acrylic anhydride
The shrinkage phenomenon of UV-NIL resists during photocuring is still regarded as an important problem hindering the wide application of UV-NIL technology. Herein, we designed four degradable UV-NIL resists with low volume shrinkage rate based on acrylic anhydride. Acrylate provided quick UV curing ability, and the resists were completely cured under a 365 nm UV light for 10 seconds. The anhydride group provided a degradation ability, causing the cured resists to be completely dissolved in an alkaline developer. Introducing rings in the molecular structure could compensate for volume shrinkage by ring-opening, and the volume shrinkage rate of the resists was below 4%. The cured resists showed good thermal stability with a decomposition temperature higher than 150 °C. The UV-NIL resists demonstrated good pattern replication ability, and distinct patterns with 100 nm resolution were obtained. The prepared UV-NIL resists are expected to play a role in the manufacturing of semiconductors, solar cells, displays, sensors, and other devices in the future.
期刊介绍:
Nanoscale is a high-impact international journal, publishing high-quality research across nanoscience and nanotechnology. Nanoscale publishes a full mix of research articles on experimental and theoretical work, including reviews, communications, and full papers.Highly interdisciplinary, this journal appeals to scientists, researchers and professionals interested in nanoscience and nanotechnology, quantum materials and quantum technology, including the areas of physics, chemistry, biology, medicine, materials, energy/environment, information technology, detection science, healthcare and drug discovery, and electronics.