InSb 中飞秒激光诱导的超快电子动力学和带隙重正化

IF 6.9 2区 材料科学 Q2 CHEMISTRY, PHYSICAL
Jingwei Dong, Runze Liu, Fanxiang Meng, Dan Luo, Luca Perfetti, Zhongwei Chen
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引用次数: 0

摘要

研究超快动力学过程对于理解光-物质耦合至关重要,而光-物质耦合对于半导体材料的光电和光子应用至关重要。在此,我们利用时间和角度分辨光电子能谱(TrARPES)研究了不同激光通量下 InSb (100) 晶体导带最小值(CBM)和带隙附近电子群的演变。与不依赖泵浦流强的电子群快速增长过程(FP)相反,慢速过程(SP)对流强很敏感,这与在 InSb (110) 晶体中观察到的温度依赖行为相似。此外,我们还观察到带隙随着光激发通量的增加而扩大。综合分析表明,这些观察到的不同结果归因于 InSb 表面的激光可调谐介电函数。我们的发现不仅加深了人们对激光与半导体相互作用的理解,而且拓宽了光电和光子器件领域的潜在应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Femtosecond laser-induced ultrafast electron dynamics and band gap renormalization in InSb

Femtosecond laser-induced ultrafast electron dynamics and band gap renormalization in InSb
Studying ultrafast dynamical processes is essential for understanding light-matter coupling, which is crucial for the optoelectronic and photonic applications of semiconductor materials. Herein, we investigate the evolution of electron population near the conduction band minimum (CBM) and band gap in InSb (100) crystal under different laser fluences using time- and angle-resolved photoelectron spectra (TrARPES). In contrast to the pump-fluence-independent fast growth process (FP) of the electron population, the slow process (SP) is fluence sensitive, which is similar to the temperature-dependent behavior observed in InSb (110). In addition, we observe a band gap enlargement with increasing the photoexcitation flux. Comprehensive analysis reveals that these observed diverse results are attributed to the laser-tunable dielectric function on the surface of InSb. Our findings not only enhance the understanding of laser-semiconductor interactions but also broaden the potential applications in the field of optoelectronic and photonic devices.
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来源期刊
Applied Surface Science
Applied Surface Science 工程技术-材料科学:膜
CiteScore
12.50
自引率
7.50%
发文量
3393
审稿时长
67 days
期刊介绍: Applied Surface Science covers topics contributing to a better understanding of surfaces, interfaces, nanostructures and their applications. The journal is concerned with scientific research on the atomic and molecular level of material properties determined with specific surface analytical techniques and/or computational methods, as well as the processing of such structures.
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