掺杂诱导带隙收缩,改变用于有机废水处理的 MoS2 电子结构

IF 4.3 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC
Yuchen Zhang, Yuehan Jia, Yanjie Li, Hongquan Xu, Jingsu Wang, Maobin Wei, Yong Zhang, Hui Yuan, Ming Gao
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引用次数: 0

摘要

MoS2 具有高比表面积和可调电子结构,在传感和环境修复领域受到广泛关注。然而,纯 MoS2 存在易聚集和电子-空穴对复杂性高等缺点,影响了其 SERS 和光催化性能。本研究采用带隙收缩策略来提高 MoS2 在 SERS 和光催化应用中的性能。它表现出很高的 SERS 活性(增强因子 (EF) = 3.61 × 108)、很高的稳定性(4 个月)、广泛的通用性(CV、CR 和 R6G)以及出色的可重复使用性(5 次循环后可回收 95%)。此外,掺杂 Ru 所引起的界面偶极-偶极相互作用和电荷转移(CT)过程共同提高了 SERS 的灵敏度,CV 的检测限低至 10-11 M。该研究探讨了掺杂引起的带隙收缩对电荷转移(CT)的影响,为提高半导体 SERS 基底的灵敏度以实现高效低浓度 SERS 检测和低成本可持续废水修复提供了新的见解。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Doping induced band-gap shrinkage to modify electronic structure of MoS2 for organic wastewater management
MoS2, with its high specific surface area and tunable electronic structure, has received much interest in the fields of sensing and environmental remediation. Nevertheless, pure MoS2 has the disadvantages of easy aggregation and the high electron-hole pairs complexity, which affects its SERS and photocatalytic performance. In this work, band-gap shrinkage strategy was used to improve MoS2 performance for SERS and photocatalytic applications. It exhibited high SERS activity (enhancement factor (EF) = 3.61 × 108), great stability (4 mth), broad universality (CV, CR and R6G), and excellent reusability (recover 95% after 5 cycles). In addition, the interfacial dipole-dipole interaction and charge transfer (CT) process caused by doping Ru together enhance the SERS sensitivity, and the limit of detection of CV is down to 10-11 M. The degradation rate of 10-5 M CV was up to 99% after 60 min of Ru-MoS2 photocatalytic degradation under visible light. This study investigated the effect of doping-induced bandgap shrinkage on charge transfer (CT), providing new insights into improving the sensitivity of semiconductors SERS substrates for efficient low-concentration SERS detection and low-cost sustainable wastewater remediation.
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来源期刊
CiteScore
7.20
自引率
4.30%
发文量
567
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