{"title":"基于多占空比级联光栅的低损耗二氧化硅边缘耦合器","authors":"Manzhuo Wang;Jimin Fang;Tingyu Liu;Zhentao Yao;Chaoyang Sun;Xiaoqiang Sun;Yuanda Wu;Daming Zhang","doi":"10.1109/LPT.2024.3483902","DOIUrl":null,"url":null,"abstract":"A silica edge coupler based on cascaded gratings with four different duty ratios is demonstrated. Finite-difference time-domain method is adopted in the coupler optimization. Ultraviolet photolithography, plasma etching and chemical vapor deposition have been adopted in the coupler preparation. When the refractive index difference between the silica core and cladding layers is 2%, the measured coupling loss is 0.52 dB/facet at the wavelength 1550 nm. The bandwidth with a penalty less than 1 dB/facet exceeds 318 nm (1300 nm - 1507 nm and 1509 nm - 1620 nm). Features of large alignment tolerance promise the edge coupler good potentials on silica platform.","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"36 24","pages":"1425-1428"},"PeriodicalIF":2.3000,"publicationDate":"2024-10-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Low-Loss Silica Edge Coupler Based on Cascaded Gratings With Multiple Duty Ratios\",\"authors\":\"Manzhuo Wang;Jimin Fang;Tingyu Liu;Zhentao Yao;Chaoyang Sun;Xiaoqiang Sun;Yuanda Wu;Daming Zhang\",\"doi\":\"10.1109/LPT.2024.3483902\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A silica edge coupler based on cascaded gratings with four different duty ratios is demonstrated. Finite-difference time-domain method is adopted in the coupler optimization. Ultraviolet photolithography, plasma etching and chemical vapor deposition have been adopted in the coupler preparation. When the refractive index difference between the silica core and cladding layers is 2%, the measured coupling loss is 0.52 dB/facet at the wavelength 1550 nm. The bandwidth with a penalty less than 1 dB/facet exceeds 318 nm (1300 nm - 1507 nm and 1509 nm - 1620 nm). Features of large alignment tolerance promise the edge coupler good potentials on silica platform.\",\"PeriodicalId\":13065,\"journal\":{\"name\":\"IEEE Photonics Technology Letters\",\"volume\":\"36 24\",\"pages\":\"1425-1428\"},\"PeriodicalIF\":2.3000,\"publicationDate\":\"2024-10-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Photonics Technology Letters\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/10723778/\",\"RegionNum\":3,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Photonics Technology Letters","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10723778/","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Low-Loss Silica Edge Coupler Based on Cascaded Gratings With Multiple Duty Ratios
A silica edge coupler based on cascaded gratings with four different duty ratios is demonstrated. Finite-difference time-domain method is adopted in the coupler optimization. Ultraviolet photolithography, plasma etching and chemical vapor deposition have been adopted in the coupler preparation. When the refractive index difference between the silica core and cladding layers is 2%, the measured coupling loss is 0.52 dB/facet at the wavelength 1550 nm. The bandwidth with a penalty less than 1 dB/facet exceeds 318 nm (1300 nm - 1507 nm and 1509 nm - 1620 nm). Features of large alignment tolerance promise the edge coupler good potentials on silica platform.
期刊介绍:
IEEE Photonics Technology Letters addresses all aspects of the IEEE Photonics Society Constitutional Field of Interest with emphasis on photonic/lightwave components and applications, laser physics and systems and laser/electro-optics technology. Examples of subject areas for the above areas of concentration are integrated optic and optoelectronic devices, high-power laser arrays (e.g. diode, CO2), free electron lasers, solid, state lasers, laser materials'' interactions and femtosecond laser techniques. The letters journal publishes engineering, applied physics and physics oriented papers. Emphasis is on rapid publication of timely manuscripts. A goal is to provide a focal point of quality engineering-oriented papers in the electro-optics field not found in other rapid-publication journals.