Femtosecond laser-induced plasma-assisted backward deposition of robustly adherent porous carbon films on glass substrates

The simple and rapid production and transfer of high-quality carbon materials are crucial for the flexible and efficient fabrication of carbon-based electronic devices. Recently, a laser-assisted transfer method combining laser-induced carbonization and transfer printing was demonstrated for the one-step preparation and transfer of patterned laser-induced carbon films to transparent substrates. However, this method is limited by insufficient robustness and weak adhesion of the carbon film post-transfer. Herein, we developed a non-contact laser-induced plasma-assisted deposition method to deposit robustly adherent porous carbon films on glass substrates. By well-adjusting the laser parameters and inserting spacers with adjustable thickness, laser-induced plasma ablation replaced direct laser ablation during femtosecond laser scanning of the substrate-polyimide-carrier sandwich structure, resulting in micro-channels with a carbon-glass recast layer instead of easily peelable flakes on the glass substrate. This hierarchical structure significantly enhances the adhesion between the laser-induced carbon film and the glass substrate, ensuring outstanding stability of the deposited carbon film under various adhesion tests. Furthermore, compared to carbon films prepared by the laser-assisted transfer method, the obtained carbon films are hydrophilic, low-resistance, and porous, facilitating the fabrication of energy storage devices. To demonstrate its practical application, a planar carbon-based micro-supercapacitor was fabricated on glass, exhibiting excellent electrochemical and cycling performance.