用于高κ介电集成的超扁平六方氮化硼

IF 37.2 1区材料科学 Q1 CHEMISTRY, PHYSICAL

Nature Materials Pub Date : 2024-10-29 DOI:10.1038/s41563-024-02013-9

Hayoung Ko, Seungjin Lee, Ki Kang Kim

引用次数: 0

摘要

一种超扁平单晶六方氮化硼薄膜能够生产晶圆级超薄高κ电介质，用于二维电子器件，从而实现国际器件与系统路线图设定的 2025 年目标。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

Ultraflat hexagonal boron nitride for high-κ dielectric integration

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Ultraflat hexagonal boron nitride for high-κ dielectric integration

An ultraflat, single-crystal hexagonal boron nitride film enables the production of wafer-scale, ultrathin high-κ dielectrics for two-dimensional electronics, meeting the 2025 targets set by the International Roadmap for Devices and Systems.

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来源期刊

Nature Materials 工程技术-材料科学：综合

CiteScore

62.20

自引率

0.70%

发文量

221

审稿时长

3.2 months

期刊介绍： Nature Materials is a monthly multi-disciplinary journal aimed at bringing together cutting-edge research across the entire spectrum of materials science and engineering. It covers all applied and fundamental aspects of the synthesis/processing, structure/composition, properties, and performance of materials. The journal recognizes that materials research has an increasing impact on classical disciplines such as physics, chemistry, and biology. Additionally, Nature Materials provides a forum for the development of a common identity among materials scientists and encourages interdisciplinary collaboration. It takes an integrated and balanced approach to all areas of materials research, fostering the exchange of ideas between scientists involved in different disciplines. Nature Materials is an invaluable resource for scientists in academia and industry who are active in discovering and developing materials and materials-related concepts. It offers engaging and informative papers of exceptional significance and quality, with the aim of influencing the development of society in the future.