通过在硅基底中埋入银离子，开发高效紫外线吸收器和可重复使用的 SERS 芯片

IF 2.4 4区物理与天体物理 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY

Current Applied Physics Pub Date : 2024-10-16 DOI:10.1016/j.cap.2024.10.013

Sudip Bhowmick , Biswarup Satpati , Debasree Chowdhury , Prasanta Karmakar

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引用次数: 0

摘要

我们报告了通过 6 keV Ag⁺离子束植入在硅基底上形成的埋藏式超薄银簇层，该层可显著增强拉曼信号。这预示着一种可靠且可重复使用的表面增强拉曼光谱（SERS）芯片即将问世。硅中存在的簇状银层也导致了明显的紫外线吸收，从而扩大了该材料在防止光降解和光电设备方面的潜力。利用 X 射线光电子能谱（XPS）、原子力显微镜和横截面透射电子显微镜（TEM）进行的物理化学分析证实，在非晶态硅层中形成了 9 纳米的银簇埋层。这种在硅中植入银离子的方法提供了一种简便的方法，可用于制造具有增强光学和光谱特性的表面。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

Development of an efficient UV absorber and reusable SERS chip by buried Ag ion implantation in Si substrate

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Development of an efficient UV absorber and reusable SERS chip by buried Ag ion implantation in Si substrate

We report the formation of a buried ultra-thin layer of Ag clusters in a Si substrate through 6 keV Ag⁺ ion beam implantation, which exhibits a significant enhancement of the Raman signal. This suggests the development of a reliable and reusable chip for Surface Enhanced Raman Spectroscopy (SERS). The presence of a clustered Ag layer in Si also leads to pronounced UV absorption, thus expanding the material's potential in safeguarding from photo-degradation and optoelectronic devices. Physicochemical analysis conducted using X-ray photoelectron spectroscopy (XPS), Atomic Force Microscopy, and cross-sectional Transmission Electron Microscopy (TEM) confirms the formation of a 9 nm buried layer of Ag clusters within the amorphous Si layer. This method of Ag ion implantation in Si offers a simple approach to engineering surfaces with enhanced optical and spectroscopic characteristics.

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来源期刊

Current Applied Physics 物理-材料科学：综合

CiteScore

4.80

自引率

0.00%

发文量

213

审稿时长

33 days

期刊介绍： Current Applied Physics (Curr. Appl. Phys.) is a monthly published international journal covering all the fields of applied science investigating the physics of the advanced materials for future applications. Other areas covered: Experimental and theoretical aspects of advanced materials and devices dealing with synthesis or structural chemistry, physical and electronic properties, photonics, engineering applications, and uniquely pertinent measurement or analytical techniques. Current Applied Physics, published since 2001, covers physics, chemistry and materials science, including bio-materials, with their engineering aspects. It is a truly interdisciplinary journal opening a forum for scientists of all related fields, a unique point of the journal discriminating it from other worldwide and/or Pacific Rim applied physics journals. Regular research papers, letters and review articles with contents meeting the scope of the journal will be considered for publication after peer review. The Journal is owned by the Korean Physical Society.