利用 CSAM 分析水电解槽钛花纹涂层的制造和性能特征

IF 7.5 Q1 CHEMISTRY, PHYSICAL
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引用次数: 0

摘要

这项研究探讨了掩模冷喷增材制造(CSAM)战略的微观结构和制造控制,该战略用于使用低成本、轻质和可加工材料生产质子交换膜(PEM)电解器的新型双极板(BPP)。CSAM 是一种固态工艺,能够基于自下而上的方法,使用带有所需图案的掩模制造三维图案部件。本研究的重点是利用掩模 CSAM 技术,研究球形(Ti-S)和不规则(Ti-I)钛粉末制造的针翅片的尺寸和微观结构特征。此外,还从耐腐蚀性和界面接触电阻 (ICR) 的角度评估了这两种钛部件在 PEM 电解槽中的应用性能。结果表明,遮蔽式 CSAM 技术可以精确控制和定制 3D 打印针翅片的尺寸,Ti-S 的孔隙率值为 6 ± 1 %,Ti-I 的孔隙率值为 4 ± 1 %。对 CSAM Ti 图形部件耐腐蚀性的评估表明,Ti-S 和 Ti-I 粉末在 PEM 水电解槽的典型工作电位(1.8 V 对 Ag/AgCl)下形成了稳定的氧化膜,没有点蚀迹象。最后,在 150 N/cm2 的压实压力下,Ti-I、Ti-S 和标准 Ti Bulk 的 ICR 值分别为 42 ± 19、40 ± 13 和 24 ± 7 mΩ-cm2。这些结果表明,掩模 CSAM 技术在制造钛 BPP 方面具有巨大的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Manufacturing and properties characterization of Ti patterned coatings for water electrolyzers by CSAM

Manufacturing and properties characterization of Ti patterned coatings for water electrolyzers by CSAM
This work investigates the microstructure and manufacturing control of the masked Cold Spray Additive Manufacturing (CSAM) strategy for producing of new bipolar plates (BPPs) for Proton Exchange Membrane (PEM) electrolyzers, using low-cost, lightweight, and machinable materials. CSAM is a solid-state process capable of fabricating 3D patterned parts based on a bottom-up approach using masks with a desired pattern. This study focuses on the dimensional and microstructural characteristics of pin fins fabricated with spherical (Ti-S) and irregular (Ti-I) Ti powders using the masked CSAM technology. Additionally, the performance of both Ti parts for its application in PEM electrolyzers was evaluated in terms of corrosion resistance and interfacial contact resistance (ICR). The results demonstrated that the masked CSAM technology allowed precise control and customization of the dimensions of the 3D-printed pin fins, obtaining porosity values of 6 ± 1 % for Ti-S and 4 ± 1 % for Ti-I. The evaluation of the corrosion resistance of the CSAM Ti patterned parts showed that for both Ti-S and Ti-I powders a stable oxide film at the typical operation potential (1.8 V vs Ag/AgCl) of a PEM water electrolyzer was formed without signs of pitting corrosion. Finally, at a compaction pressure of 150 N/cm2 ICR values of 42 ± 19, 40 ± 13, and 24 ± 7 mΩ·cm2 were obtained for Ti-I, Ti-S, and standard Ti Bulk, respectively. The results suggest than the masked CSAM technology shows great potential for the fabrication of Ti BPPs.
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CiteScore
8.10
自引率
1.60%
发文量
128
审稿时长
66 days
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