光化学酸生成的量子电动力学公式及其对光学光刻技术的影响

IF 1.3 4区 计算机科学 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Seungjin Lee
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引用次数: 0

摘要

光化学酸生成是从量子电动力学的第一原理提炼出来的。首先,我们简要回顾了基于量子电动力学框架的光量子理论的表述,以确定在给定时空点酸生成的概率。然后将量子力学酸生成与去保护机制相结合,得到与光刻胶中特征形成直接相关的去保护密度的概率描述。通过对随机去保护密度的统计分析,揭示了随机特征形成的主要特征。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Quantum electrodynamical formulation of photochemical acid generation and its implications on optical lithography

Quantum electrodynamical formulation of photochemical acid generation and its implications on optical lithography

The photochemical acid generation is refined from the first principles of quantum electrodynamics. First, we briefly review the formulation of the quantum theory of light based on the quantum electrodynamics framework to establish the probability of acid generation at a given spacetime point. The quantum mechanical acid generation is then combined with the deprotection mechanism to obtain a probabilistic description of the deprotection density directly related to feature formation in a photoresist. A statistical analysis of the random deprotection density is presented to reveal the leading characteristics of stochastic feature formation.

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来源期刊
ETRI Journal
ETRI Journal 工程技术-电信学
CiteScore
4.00
自引率
7.10%
发文量
98
审稿时长
6.9 months
期刊介绍: ETRI Journal is an international, peer-reviewed multidisciplinary journal published bimonthly in English. The main focus of the journal is to provide an open forum to exchange innovative ideas and technology in the fields of information, telecommunications, and electronics. Key topics of interest include high-performance computing, big data analytics, cloud computing, multimedia technology, communication networks and services, wireless communications and mobile computing, material and component technology, as well as security. With an international editorial committee and experts from around the world as reviewers, ETRI Journal publishes high-quality research papers on the latest and best developments from the global community.
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