BiMO3(M = Co、Fe、Mn)包晶激活基于过一硫酸盐的高级氧化过程降解吡虫啉

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Wenxuan Xia, Yu Liu, Lin Wang, Dongxu Gu, Jianyuan Hao
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引用次数: 0

摘要

人们对含双的 ABO3 型过氧化物的晶体结构、无铅铁电性、多铁性以及最近的光催化性能进行了广泛的研究。然而,关于它们在基于 PMS 的高级氧化过程中的应用的报道却很少。本研究采用水热法轻松合成了 BiMO3(M = Co、Fe、Mn),并将其与过硫酸盐(PMS)相结合,用于降解水中的持久性污染物吡虫啉。在 pH 值为 9 的条件下,BiCoO3/PMS 可高效降解吡虫啉。Co2⁺/Co3⁺ 的氧化还原反应被认为是活化 PMS 的主要动力。此外,还研究了 BiCoO3/PMS 降解吡虫啉的机理。这种低成本、易制备的材料为去除水中的有机污染物提供了一种新方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

BiMO3 (M = Co, Fe, Mn) perovskite activating peroxymonosulfate-based advanced oxidation process in imidacloprid degradation

BiMO3 (M = Co, Fe, Mn) perovskite activating peroxymonosulfate-based advanced oxidation process in imidacloprid degradation

Bi-containing ABO3-type perovskites have been extensively studied for their crystal structure, lead-free ferroelectricity, multiferroic properties, and more recently, photocatalysis. However, there are few reports on their application in PMS-based advanced oxidation processes. In this study, BiMO3 (M = Co, Fe, Mn) was readily synthesized using a hydrothermal method and combined with peroxymonosulfate (PMS) to degrade the persistent pollutant imidacloprid in water. BiCoO3/PMS demonstrated efficient imidacloprid degradation at pH 9. The concentration of PMS and the catalyst significantly influence the degradation efficiency. The redox reaction of Co2⁺/Co3⁺ was identified as the primary driving force for activating PMS. The mechanism of imidacloprid degradation by BiCoO3/PMS was also investigated. This low-cost, easily prepared material offers a new approach for removing organic pollutants from water.

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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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