Mehmet Batuhan Topal, Hilal Kubra Saglam, Mehmet Ertugrul, Esen Tasgin, Hayrunnisa Nadaroglu
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引用次数: 0
摘要
Allura 红(E129)属于偶氮染料类,是食品、化妆品和制药行业使用的合成染料之一。鉴于其在工业中的使用日益增多,并具有潜在的健康风险,因此确定其最低浓度非常重要。因此,本研究采用基于电阻变化检测的安培法,在钠钙玻璃基底上使用超声喷射热解法沉积 ZnO NPs 薄膜层,进行了 AR 电化学检测平台的开发实验。使用超声波溅射法(USP)在 400 °C 下在钠钙玻璃基底上生长了未掺杂和 Na+离子(2% 和 4%)掺杂的氧化锌薄膜。利用 XRD、FESEM 和 EDS 等多种分析方法对制备的 Na+@ZnO 薄膜进行了表征。结果表明,氧化锌均匀地分散在玻璃表面,对低浓度偶氮染料的检测有积极影响。安培法测定了水中 AR 偶氮染料的含量。这项研究表明,新型 Na+@ZnO 电催化剂中精心设计的分层结构可成功检测浓度低至 0.01 ppb 的偶氮染料。
Na-doped ZnO thin film by USP method for amperometric detection of Alura Red (E129) azo dye
Allura red (E129), which is in the azo dye class, is one of the synthetic dyes used in the food, cosmetic, and pharmaceutical industries. Given its growing industrial use and potential health risks, it’s important to determine its concentration at the lowest possible level. Therefore, in this study, experiments were conducted on the development of a platform for the electrochemical detection of AR with thin film layers of ZnO NPs deposited using the ultrasonic spray pyrolysis method on soda-lime glass substrates using the amperometric method based on the detection of resistance change. Undoped and Na+ ions (2% and 4%)-doped ZnO thin films were grown on soda-lime glass substrates at 400 °C using ultrasonic sputtering (USP). The characterization of the produced Na+@ZnO thin films was performed using various analysis methods, including XRD, FESEM, and EDS. The results showed that ZnO was homogeneously dispersed on the glass surface and positively affected the detection of azo dyes at low concentrations. The amperometric method determined the amount of AR azo dye in water. This research demonstrates that a well-designed hierarchical structure in the new Na+@ZnO electrocatalyst can successfully detect azo dye at concentrations as low as 0.01 ppb.
期刊介绍:
The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.