Electron field emission property of NiO-decorated ZnO nanorods grown on diamond films

ZnO/micron diamond (MCD) composite structure combines two wide-band gap semiconductor materials, providing stable performance suitable for high-performance electron field emission (EFE) devices operating in various complex environments. Nonetheless, the optical and electrochemical limitations of ZnO constrain its effectiveness. Typically, NiO can compensate these inherent defects in ZnO, thereby enhancing the performance of field-emitting devices. In this research, NiO-decorated ZnO thin films were fabricated on diamond surfaces using hydrothermal/sol-gel two-step method. The impact of varying Ni doping concentrations caused by nickel acetate solutions on the field emission properties was thoroughly investigated. Furthermore, this study involved the fabrication of NiO-decorated ZnO/micron diamond heterojunction composite structures, exploring the impact of the structure on the optoelectronic performance of the devices. The Ni doping concentration increases in the NiO films formed between the ZnO nanorods, the doped Ni exists in the ZnO/MCD composite structure as both Ni²⁺ and Ni³⁺, which are important materials for semiconductor electronic devices. The NiO decoration process induced the creation of defect levels within the bandgap of the nanorod array structure, consequently enhancing the photoluminescence performance of ZnO. Furthermore, the interaction between NiO and ZnO facilitated the formation of a p-n junction at the interface, generating an internal electric field. This electric field significantly improved the current conduction field and maximum current density of ZnO, thereby enhancing its electric field emission performance. The optical and electrical properties of ZnO nanorods doped at 0.1M exhibited the most favorable characteristics among all tested samples. At a doping concentration of 0.1 M, the turn-on electric field reaches a minimum value of 0.96 V/μm and the maximum current density J reaches a maximum value of 2.54 mA/cm². These results offer novel insights for advancing the development of integrated broadband optical devices.