E. O. Nasakina, M. A. Sudarchikova, A. S. Baikin, A. A. Mel’nikova, A. V. Mikhailova, N. A. Dormidontov, P. A. Prokof’ev, S. V. Konushkin, K. V. Sergienko, M. A. Kaplan, M. A. Sevost’yanov, A. G. Kolmakov
{"title":"退火对磁控溅射二氧化铈表面层结构的影响","authors":"E. O. Nasakina, M. A. Sudarchikova, A. S. Baikin, A. A. Mel’nikova, A. V. Mikhailova, N. A. Dormidontov, P. A. Prokof’ev, S. V. Konushkin, K. V. Sergienko, M. A. Kaplan, M. A. Sevost’yanov, A. G. Kolmakov","doi":"10.1134/S0036029523110113","DOIUrl":null,"url":null,"abstract":"<p>Magnetron sputtering and subsequent annealing are used to form nano- and micron-sized cerium dioxide (CeO<sub>2</sub>) surface layers on a VT6 titanium alloy base. The structure of samples is studied by scanning electron microscopy, Auger-electron spectroscopy, energy dispersive spectroscopy, and X-ray diffraction analysis. We detected a linear dependence of the surface layer thickness on the deposition time, a nonlinear increase in the thickness with the supply power, an increase in the surface roughness, and delamination and surface layer loosening, which are likely to be related to annealing. For samples with a surface layer less than 750 nm in thickness, the formation of a TiO<sub>2</sub>, Al<sub>2</sub>O<sub>3</sub>, and CeVO<sub>4</sub> sublayer is found; at a layer thickness of less than 300 nm, the entire cerium dioxide is consumed to form vanadate from vanadium dioxide.</p>","PeriodicalId":769,"journal":{"name":"Russian Metallurgy (Metally)","volume":null,"pages":null},"PeriodicalIF":0.4000,"publicationDate":"2024-03-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Effect of Annealing on the Structure of Magnetron-Sputtered Cerium Dioxide Surface Layers\",\"authors\":\"E. O. Nasakina, M. A. Sudarchikova, A. S. Baikin, A. A. Mel’nikova, A. V. Mikhailova, N. A. Dormidontov, P. A. Prokof’ev, S. V. Konushkin, K. V. Sergienko, M. A. Kaplan, M. A. Sevost’yanov, A. G. Kolmakov\",\"doi\":\"10.1134/S0036029523110113\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p>Magnetron sputtering and subsequent annealing are used to form nano- and micron-sized cerium dioxide (CeO<sub>2</sub>) surface layers on a VT6 titanium alloy base. The structure of samples is studied by scanning electron microscopy, Auger-electron spectroscopy, energy dispersive spectroscopy, and X-ray diffraction analysis. We detected a linear dependence of the surface layer thickness on the deposition time, a nonlinear increase in the thickness with the supply power, an increase in the surface roughness, and delamination and surface layer loosening, which are likely to be related to annealing. For samples with a surface layer less than 750 nm in thickness, the formation of a TiO<sub>2</sub>, Al<sub>2</sub>O<sub>3</sub>, and CeVO<sub>4</sub> sublayer is found; at a layer thickness of less than 300 nm, the entire cerium dioxide is consumed to form vanadate from vanadium dioxide.</p>\",\"PeriodicalId\":769,\"journal\":{\"name\":\"Russian Metallurgy (Metally)\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.4000,\"publicationDate\":\"2024-03-20\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Russian Metallurgy (Metally)\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://link.springer.com/article/10.1134/S0036029523110113\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"METALLURGY & METALLURGICAL ENGINEERING\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Russian Metallurgy (Metally)","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1134/S0036029523110113","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"METALLURGY & METALLURGICAL ENGINEERING","Score":null,"Total":0}
Effect of Annealing on the Structure of Magnetron-Sputtered Cerium Dioxide Surface Layers
Magnetron sputtering and subsequent annealing are used to form nano- and micron-sized cerium dioxide (CeO2) surface layers on a VT6 titanium alloy base. The structure of samples is studied by scanning electron microscopy, Auger-electron spectroscopy, energy dispersive spectroscopy, and X-ray diffraction analysis. We detected a linear dependence of the surface layer thickness on the deposition time, a nonlinear increase in the thickness with the supply power, an increase in the surface roughness, and delamination and surface layer loosening, which are likely to be related to annealing. For samples with a surface layer less than 750 nm in thickness, the formation of a TiO2, Al2O3, and CeVO4 sublayer is found; at a layer thickness of less than 300 nm, the entire cerium dioxide is consumed to form vanadate from vanadium dioxide.
期刊介绍：
Russian Metallurgy (Metally) publishes results of original experimental and theoretical research in the form of reviews and regular articles devoted to topical problems of metallurgy, physical metallurgy, and treatment of ferrous, nonferrous, rare, and other metals and alloys, intermetallic compounds, and metallic composite materials. The journal focuses on physicochemical properties of metallurgical materials (ores, slags, matters, and melts of metals and alloys); physicochemical processes (thermodynamics and kinetics of pyrometallurgical, hydrometallurgical, electrochemical, and other processes); theoretical metallurgy; metal forming; thermoplastic and thermochemical treatment; computation and experimental determination of phase diagrams and thermokinetic diagrams; mechanisms and kinetics of phase transitions in metallic materials; relations between the chemical composition, phase and structural states of materials and their physicochemical and service properties; interaction between metallic materials and external media; and effects of radiation on these materials.
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