大尺寸和薄型光伏单晶硅片的断裂强度分析

IF 4.7 2区 工程技术 Q1 MECHANICS
Dameng Cheng, Yufei Gao, Guanzheng Li
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引用次数: 0

摘要

金刚线切片技术是制造单晶硅太阳能电池衬底的主要方法。随着技术的发展,单晶硅片的尺寸和厚度分别越来越大和越来越薄,导致硅片在加工和后处理过程中的断裂概率增加。而锯切速度、锯丝直径和磨料尺寸的变化也会影响硅片的表面特性,从而影响其断裂强度。本文以 210 mm × 210 mm 的大尺寸单晶硅片为研究对象,对各系列硅片进行了四点弯曲试验。收集了弯曲试验过程中的载荷-位移曲线,并用有限元法计算了断裂应力值。利用 Weibull 分布函数对数据进行统计分析,得出了各系列硅片的特征断裂强度和 Weibull 模量。分析了硅片厚度、硅片在硅砖中的位置(锯丝使用时间不同)和弯曲测试方向对断裂特性的影响。结果表明,厚度增加会提高硅片的特征断裂强度。前硅片(由新鲜锯丝锯开)的特征断裂强度最小,而中间硅片和后硅片(由磨损锯丝锯开)的特征断裂强度相近。垂直于锯痕方向弯曲的特征断裂强度是平行于锯痕方向弯曲的 2-3 倍。根据硅片的表面形态、粗糙度和锯痕,分析了特征断裂强度不同的原因。本文研究了大尺寸单晶硅片的断裂特性,为工业生产提供断裂数据支持。揭示了硅片断裂的机理和主要影响因素,为在硅片生产过程和后处理中提高锯切质量和降低断裂概率提供了方向。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fracture strength analysis of large-size and thin photovoltaic monocrystalline silicon wafers
Diamond wire slicing technology is the main method to manufacture the substrate of the monocrystalline silicon-based solar cells. With the development of technology, the size and thickness of monocrystalline silicon wafer are respectively getting larger and thinner, which cause an increase in silicon wafer fracture probability during wafer processing and post-processing. And the change of the sawing speed, saw wire diameter and abrasive size also affect the wafer’s surface characteristics, thereby affect its fracture strength. In this paper, monocrystalline silicon wafer with large size of 210 mm × 210 mm was taken as the research object, 4-point bending test was carried out on each series of silicon wafers. The load–displacement curves during bending test were collected, and the fracture stress values were calculated by finite element method. The characteristic fracture strength and Weibull modulus of each series of silicon wafers were obtained through the statistical analysis of the data using Weibull distribution function. The effect of the silicon wafer thickness, the position of the silicon wafer in the silicon brick (usage time of the saw wire varies), and the bending test direction on the fracture characteristics was analyzed. The results showed that the increase of thickness increase the characteristic fracture strength of silicon wafer. The characteristic fracture strength of the front wafers (sawn by the fresh wire) is the smallest, while the characteristic fracture strength of the middle wafers and the rear wafers (sawn by the worn wire) are similar. The characteristic fracture strength of bending in the direction of perpendicular to the saw marks is 2–3 times that of bending in the direction of parallel to the saw marks. The reason of the difference of characteristic fracture strength was analyzed based on the surface morphology, roughness, and the saw marks of silicon wafer. In this paper, the fracture characteristics of large size monocrystalline silicon wafer are studied to provide fracture data support for industry production. The mechanism and main effect factors of silicon wafer fracture are revealed, which provides directions for improving the sawing quality and reducing the fracture probability during wafer production process and post-processing.
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来源期刊
CiteScore
8.70
自引率
13.00%
发文量
606
审稿时长
74 days
期刊介绍: EFM covers a broad range of topics in fracture mechanics to be of interest and use to both researchers and practitioners. Contributions are welcome which address the fracture behavior of conventional engineering material systems as well as newly emerging material systems. Contributions on developments in the areas of mechanics and materials science strongly related to fracture mechanics are also welcome. Papers on fatigue are welcome if they treat the fatigue process using the methods of fracture mechanics.
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