Synthesis of complex concentrated silicide coatings via reactive melt-infiltration: Exploring interfacial phenomena between Si-B melt and MoNbTaW high-entropy alloy

High-entropy silicide (HES) coatings are a promising solution to the problem of poor oxidation resistance of metallic refractory alloys. However, their practical development is still in the early stages. For the first time, this study evaluates the feasibility of synthesizing complex concentrated silicide coatings using a reactive melt infiltration approach. For this purpose, a sessile drop experiment was carried out in which a binary eutectic silicon‑boron alloy (Si8B at.%) was subjected to contact heating with the MoNbTaW refractory high entropy alloy (RHEA) substrate at temperatures up to 1450 °C. After the high-temperature test, the solidified couple was characterized by X-ray diffraction, scanning electron microscopy coupled with energy-dispersive X-ray spectroscopy, electron backscatter diffraction systems, and microhardness techniques. The coating had an average thickness of 75 μm and was composed of different layers, including a primary MSi₂ layer, a transition MSi₂ + M₅Si₃ silicide layer, and M₅Si₃ silicides (M = metal). Additionally, borosilicides and boride particles were dispersed throughout the layers. However, future research should prioritize refining process parameters to eliminate porosity and improve the integrity of the coating layer.