{"title":"基底温度和偏置电压对共溅射 (TiZrHfTa)Nx 薄膜机械和摩擦学特性的影响","authors":"","doi":"10.1016/j.surfcoat.2024.131403","DOIUrl":null,"url":null,"abstract":"<div><div>This study investigated the effects of substrate temperature and bias voltage on the mechanical and tribological properties of cosputtered (TiZrHfTa)N<sub><em>x</em></sub> films. A substrate temperature ranging from room temperature to 400 °C, and a bias voltage ranging from 0 to −150 V were selected as the sputtering variables. A mixture gas with a nitrogen flow ratio (<em>f</em><sub>N2</sub> = N<sub>2</sub>/[N<sub>2</sub> + Ar]) of 0.2 was used to fabricate nitride films. Nanoindentation and wear tests were conducted to assess the performance of the fabricated (TiZrHfTa)N<sub><em>x</em></sub> films, which formed a single face-centered cubic structure. Increasing the substrate temperature resulted in grain growth, lattice shrinkage, and nonsignificant improvements in mechanical properties. Applying a bias voltage of −150 V to the substrate increased the hardness of the fabricated film to a peak of 32.7 GPa compared with that of 29.3 GPa for the film prepared in an electronically grounded state. The (Ti<sub>0.24</sub>Zr<sub>0.22</sub>Hf<sub>0.19</sub>Ta<sub>0.35</sub>)N<sub>0.66</sub> film prepared at a bias voltage of 0 V and substrate temperature of 400 °C exhibited the optimal combination of mechanical and tribological properties (hardness, 30.0 GPa; elastic modulus, 325 GPa; and wear rate, 1.16 × 10<sup>−5</sup> mm<sup>3</sup>/Nm).</div></div>","PeriodicalId":22009,"journal":{"name":"Surface & Coatings Technology","volume":null,"pages":null},"PeriodicalIF":5.3000,"publicationDate":"2024-09-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Effects of substrate temperature and bias voltage on mechanical and tribological properties of cosputtered (TiZrHfTa)Nx films\",\"authors\":\"\",\"doi\":\"10.1016/j.surfcoat.2024.131403\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>This study investigated the effects of substrate temperature and bias voltage on the mechanical and tribological properties of cosputtered (TiZrHfTa)N<sub><em>x</em></sub> films. A substrate temperature ranging from room temperature to 400 °C, and a bias voltage ranging from 0 to −150 V were selected as the sputtering variables. A mixture gas with a nitrogen flow ratio (<em>f</em><sub>N2</sub> = N<sub>2</sub>/[N<sub>2</sub> + Ar]) of 0.2 was used to fabricate nitride films. Nanoindentation and wear tests were conducted to assess the performance of the fabricated (TiZrHfTa)N<sub><em>x</em></sub> films, which formed a single face-centered cubic structure. Increasing the substrate temperature resulted in grain growth, lattice shrinkage, and nonsignificant improvements in mechanical properties. Applying a bias voltage of −150 V to the substrate increased the hardness of the fabricated film to a peak of 32.7 GPa compared with that of 29.3 GPa for the film prepared in an electronically grounded state. The (Ti<sub>0.24</sub>Zr<sub>0.22</sub>Hf<sub>0.19</sub>Ta<sub>0.35</sub>)N<sub>0.66</sub> film prepared at a bias voltage of 0 V and substrate temperature of 400 °C exhibited the optimal combination of mechanical and tribological properties (hardness, 30.0 GPa; elastic modulus, 325 GPa; and wear rate, 1.16 × 10<sup>−5</sup> mm<sup>3</sup>/Nm).</div></div>\",\"PeriodicalId\":22009,\"journal\":{\"name\":\"Surface & Coatings Technology\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":5.3000,\"publicationDate\":\"2024-09-25\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Surface & Coatings Technology\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S025789722401034X\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"MATERIALS SCIENCE, COATINGS & FILMS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface & Coatings Technology","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S025789722401034X","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
Effects of substrate temperature and bias voltage on mechanical and tribological properties of cosputtered (TiZrHfTa)Nx films
This study investigated the effects of substrate temperature and bias voltage on the mechanical and tribological properties of cosputtered (TiZrHfTa)Nx films. A substrate temperature ranging from room temperature to 400 °C, and a bias voltage ranging from 0 to −150 V were selected as the sputtering variables. A mixture gas with a nitrogen flow ratio (fN2 = N2/[N2 + Ar]) of 0.2 was used to fabricate nitride films. Nanoindentation and wear tests were conducted to assess the performance of the fabricated (TiZrHfTa)Nx films, which formed a single face-centered cubic structure. Increasing the substrate temperature resulted in grain growth, lattice shrinkage, and nonsignificant improvements in mechanical properties. Applying a bias voltage of −150 V to the substrate increased the hardness of the fabricated film to a peak of 32.7 GPa compared with that of 29.3 GPa for the film prepared in an electronically grounded state. The (Ti0.24Zr0.22Hf0.19Ta0.35)N0.66 film prepared at a bias voltage of 0 V and substrate temperature of 400 °C exhibited the optimal combination of mechanical and tribological properties (hardness, 30.0 GPa; elastic modulus, 325 GPa; and wear rate, 1.16 × 10−5 mm3/Nm).
期刊介绍:
Surface and Coatings Technology is an international archival journal publishing scientific papers on significant developments in surface and interface engineering to modify and improve the surface properties of materials for protection in demanding contact conditions or aggressive environments, or for enhanced functional performance. Contributions range from original scientific articles concerned with fundamental and applied aspects of research or direct applications of metallic, inorganic, organic and composite coatings, to invited reviews of current technology in specific areas. Papers submitted to this journal are expected to be in line with the following aspects in processes, and properties/performance:
A. Processes: Physical and chemical vapour deposition techniques, thermal and plasma spraying, surface modification by directed energy techniques such as ion, electron and laser beams, thermo-chemical treatment, wet chemical and electrochemical processes such as plating, sol-gel coating, anodization, plasma electrolytic oxidation, etc., but excluding painting.
B. Properties/performance: friction performance, wear resistance (e.g., abrasion, erosion, fretting, etc), corrosion and oxidation resistance, thermal protection, diffusion resistance, hydrophilicity/hydrophobicity, and properties relevant to smart materials behaviour and enhanced multifunctional performance for environmental, energy and medical applications, but excluding device aspects.