基底温度和偏置电压对共溅射 (TiZrHfTa)Nx 薄膜机械和摩擦学特性的影响

IF 5.3 2区 材料科学 Q1 MATERIALS SCIENCE, COATINGS & FILMS
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引用次数: 0

摘要

本研究探讨了基片温度和偏压对共溅射 (TiZrHfTa)Nx 薄膜的机械和摩擦学性能的影响。基片温度范围为室温至 400 °C,偏置电压范围为 0 至 -150 V,作为溅射变量。氮气流量比(fN2 = N2/[N2 + Ar])为 0.2 的混合气体用于制造氮化物薄膜。通过纳米压痕和磨损测试评估了制备的 (TiZrHfTa)Nx 薄膜的性能,这些薄膜形成了单面心立方结构。基底温度升高会导致晶粒长大、晶格收缩以及机械性能无明显改善。在基底上施加-150 V的偏置电压会使制备的薄膜硬度增加到32.7 GPa的峰值,而在电子接地状态下制备的薄膜硬度为29.3 GPa。在偏置电压为 0 V、基底温度为 400 °C 的条件下制备的 (Ti0.24Zr0.22Hf0.19Ta0.35)N0.66 薄膜显示出机械和摩擦学特性的最佳组合(硬度为 30.0 GPa;弹性模量为 325 GPa;磨损率为 1.16 × 10-5 mm3/Nm)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effects of substrate temperature and bias voltage on mechanical and tribological properties of cosputtered (TiZrHfTa)Nx films
This study investigated the effects of substrate temperature and bias voltage on the mechanical and tribological properties of cosputtered (TiZrHfTa)Nx films. A substrate temperature ranging from room temperature to 400 °C, and a bias voltage ranging from 0 to −150 V were selected as the sputtering variables. A mixture gas with a nitrogen flow ratio (fN2 = N2/[N2 + Ar]) of 0.2 was used to fabricate nitride films. Nanoindentation and wear tests were conducted to assess the performance of the fabricated (TiZrHfTa)Nx films, which formed a single face-centered cubic structure. Increasing the substrate temperature resulted in grain growth, lattice shrinkage, and nonsignificant improvements in mechanical properties. Applying a bias voltage of −150 V to the substrate increased the hardness of the fabricated film to a peak of 32.7 GPa compared with that of 29.3 GPa for the film prepared in an electronically grounded state. The (Ti0.24Zr0.22Hf0.19Ta0.35)N0.66 film prepared at a bias voltage of 0 V and substrate temperature of 400 °C exhibited the optimal combination of mechanical and tribological properties (hardness, 30.0 GPa; elastic modulus, 325 GPa; and wear rate, 1.16 × 10−5 mm3/Nm).
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来源期刊
Surface & Coatings Technology
Surface & Coatings Technology 工程技术-材料科学:膜
CiteScore
10.00
自引率
11.10%
发文量
921
审稿时长
19 days
期刊介绍: Surface and Coatings Technology is an international archival journal publishing scientific papers on significant developments in surface and interface engineering to modify and improve the surface properties of materials for protection in demanding contact conditions or aggressive environments, or for enhanced functional performance. Contributions range from original scientific articles concerned with fundamental and applied aspects of research or direct applications of metallic, inorganic, organic and composite coatings, to invited reviews of current technology in specific areas. Papers submitted to this journal are expected to be in line with the following aspects in processes, and properties/performance: A. Processes: Physical and chemical vapour deposition techniques, thermal and plasma spraying, surface modification by directed energy techniques such as ion, electron and laser beams, thermo-chemical treatment, wet chemical and electrochemical processes such as plating, sol-gel coating, anodization, plasma electrolytic oxidation, etc., but excluding painting. B. Properties/performance: friction performance, wear resistance (e.g., abrasion, erosion, fretting, etc), corrosion and oxidation resistance, thermal protection, diffusion resistance, hydrophilicity/hydrophobicity, and properties relevant to smart materials behaviour and enhanced multifunctional performance for environmental, energy and medical applications, but excluding device aspects.
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