掺铋砷化镓层的制备与特性研究

IF 0.6 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER
D. A. Zdoroveyshchev, O. V. Vikhrova, Yu. A. Danilov, V. P. Lesnikov, A. V. Nezhdanov, A. E. Parafin, S. M. Plankina
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引用次数: 0

摘要

摘要 在真空中于 220°C 下用脉冲激光沉积大量掺杂锰和/或铋的砷化镓层,从而在 i-GaAs (100) 基底上形成纳米结构。研究表明,为了实现锰的电活化,最好使用波长为 248 nm、持续时间为 30 ns 的准分子激光脉冲进行后续退火。铋并不能阻止退火过程中锰原子的活化,反而会增加 GaMnAs 铁磁半导体的矫顽力场。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Fabrication and Study of the Properties of GaAs Layers Doped with Bismuth

Fabrication and Study of the Properties of GaAs Layers Doped with Bismuth

Abstract

Pulsed laser deposition in vacuum at 220°C of GaAs layers heavily doped with Mn and/or Bi has been used to form nanostructures on i-GaAs (100) substrates. It is shown that, for the electrical activation of manganese, it is expedient to use subsequent annealing with an excimer laser pulse with a wavelength of 248 nm and a duration of 30 ns. The structures show an anomalous Hall effect with a hysteresis loop on the magnetic field dependence up to a Curie temperature of about ~70 K. Negative magnetoresistance is observed up to temperatures of ≈150 K. Bismuth does not prevent the activation of Mn atoms during annealing and contributes to an increase in the coercive field of the GaMnAs ferromagnetic semiconductor.

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来源期刊
Semiconductors
Semiconductors 物理-物理:凝聚态物理
CiteScore
1.50
自引率
28.60%
发文量
131
审稿时长
3-6 weeks
期刊介绍: Publishes the most important work in semiconductor research in the countries of the former Soviet Union. Covers semiconductor theory, transport phenomena in semiconductors, optics, magnetooptics, and electrooptics of semiconductors, semiconductor lasers and semiconductor surface physics. The journal features an extensive book review section.
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