原位研究揭示金表面活性剂对利用高功率脉冲磁控溅射沉积形成超薄银层的影响

IF 8 2区 材料科学 Q1 CHEMISTRY, PHYSICAL
Suzhe Liang, Tianfu Guan, Shanshan Yin, Suo Tu, Renjun Guo, Yusuf Bulut, Kristian Amand Reck, Jonas Drewes, Wei Chen, Thomas Strunskus, Matthias Schwartzkopf, Franz Faupel, Stephan Volkher Roth, Yajun Cheng, Peter Müller-Buschbaum
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引用次数: 0

摘要

在基底上引入金属纳米颗粒(如金)作为表面活性剂或润湿诱导剂,已被证明是在随后的银沉积过程中促进超薄银层(UTSL)形成的一种简单而有效的方法。然而,大多数研究都非常关注金属表面活性剂辅助超薄银层的应用,却忽视了金属表面活性剂如何影响超薄银层形成的内在机制。在此,我们应用原位掠入射宽/小角 X 射线散射揭示了金表面活性剂或种子层(预沉积金纳米粒子)对氧化锌(ZnO)薄膜上高功率脉冲磁控溅射沉积(HiPIMS)形成 UTSL 的影响。根据对原位 X 射线散射数据的全面深入分析,我们观察到尽管使用了 HiPIMS,但预沉积的金纳米粒子可以作为溅射的银原子的附加缺陷或生长核心,而 HiPIMS 本身已经形成了许多成核点。因此,与裸 ZnO 薄膜相比,HiPIMS 能更早地形成连续光滑的 UTSL。基于原位测量所揭示的机制,我们深入了解了UTSL的形成和基于UTSL的进一步应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
In situ Studies Revealing the Effect of Au Surfactant on the Formation of Ultra-Thin Ag Layers Using High-power Impulse Magnetron Sputter Deposition
Introducing metallic nanoparticles, such as Au, on the substrate as a surfactant or wetting inducer has been demonstrated as a simple but effective way to facilitate the formation of ultra-thin silver layers (UTSLs) during the following Ag deposition. However, most research paid much attention to the applications of UTSLs assisted by metallic surfactants but neglected the underlying mechanisms of how the metallic surfactant affects the formation of UTSL. Here, we apply in situ grazing-incidence wide-/small-angle X-ray scattering to reveal the effects of the Au surfactant or seed layer (pre-deposited Au nanoparticles) on the formation of UTSL by high-power impulse magnetron sputter deposition (HiPIMS) on a zinc oxide (ZnO) thin film. According to the comprehensive and in-depth analysis of the in situ X-ray scattering data, we observe that the pre-deposited Au nanoparticles can act as additional defects or growth cores for the sputtered Ag atoms despite using HiPIMS, which itself already forms many nucleation sites. As a result, the formation of a continuous and smooth UTSL is reached earlier in HiPIMS as compared with bare ZnO thin films. Based on the mechanism revealed by the in situ measurements, we provide insight into the formation of UTSL and further UTSL-based applications.
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来源期刊
Nanoscale Horizons
Nanoscale Horizons Materials Science-General Materials Science
CiteScore
16.30
自引率
1.00%
发文量
141
期刊介绍: Nanoscale Horizons stands out as a premier journal for publishing exceptionally high-quality and innovative nanoscience and nanotechnology. The emphasis lies on original research that introduces a new concept or a novel perspective (a conceptual advance), prioritizing this over reporting technological improvements. Nevertheless, outstanding articles showcasing truly groundbreaking developments, including record-breaking performance, may also find a place in the journal. Published work must be of substantial general interest to our broad and diverse readership across the nanoscience and nanotechnology community.
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