{"title":"通过顺序物理气相沉积法制备的碘化亚锡甲基铵薄膜的特征","authors":"","doi":"10.1016/j.physb.2024.416496","DOIUrl":null,"url":null,"abstract":"<div><p>Methylammonium tin triiodide (MASnI<sub>3</sub>) films were grown through Sequential Physical Vapour Deposition (SPVD) without breaking the vacuum and optimized by varying MAI thickness and annealing time while keeping SnI<sub>2</sub> thickness constant. The film's crystallinity increased with MAI thickness and annealing time. Optimal bandgap was attained for the film with 500 nm MAI annealed for 20 & 40 min. FE-SEM revealed densely packed, large grains, increasing in size with MAI thickness and on annealing from 0 to 40 min and decreasing at 80 min. The film with 300 nm MAI thickness annealed for 40 min showed the strongest PL intensity suggesting reduced carrier recombination losses. Trap densities reduced with annealing time and MAI thickness due to improvements in films' crystallinity, grain sizes and reduced grain boundaries which act as carrier trapping sites. Hence, films prepared through SPVD, exhibit excellent structural, optical, and morphological properties, suitable for photovoltaic applications.</p></div>","PeriodicalId":20116,"journal":{"name":"Physica B-condensed Matter","volume":null,"pages":null},"PeriodicalIF":2.8000,"publicationDate":"2024-09-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Characterization of methylammonium tin iodide thin films prepared by sequential physical vapour deposition\",\"authors\":\"\",\"doi\":\"10.1016/j.physb.2024.416496\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Methylammonium tin triiodide (MASnI<sub>3</sub>) films were grown through Sequential Physical Vapour Deposition (SPVD) without breaking the vacuum and optimized by varying MAI thickness and annealing time while keeping SnI<sub>2</sub> thickness constant. The film's crystallinity increased with MAI thickness and annealing time. Optimal bandgap was attained for the film with 500 nm MAI annealed for 20 & 40 min. FE-SEM revealed densely packed, large grains, increasing in size with MAI thickness and on annealing from 0 to 40 min and decreasing at 80 min. The film with 300 nm MAI thickness annealed for 40 min showed the strongest PL intensity suggesting reduced carrier recombination losses. Trap densities reduced with annealing time and MAI thickness due to improvements in films' crystallinity, grain sizes and reduced grain boundaries which act as carrier trapping sites. Hence, films prepared through SPVD, exhibit excellent structural, optical, and morphological properties, suitable for photovoltaic applications.</p></div>\",\"PeriodicalId\":20116,\"journal\":{\"name\":\"Physica B-condensed Matter\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":2.8000,\"publicationDate\":\"2024-09-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Physica B-condensed Matter\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0921452624008378\",\"RegionNum\":3,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"PHYSICS, CONDENSED MATTER\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Physica B-condensed Matter","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0921452624008378","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, CONDENSED MATTER","Score":null,"Total":0}
引用次数: 0
摘要
在不破坏真空的情况下,通过顺序物理气相沉积(SPVD)技术生长了甲基铵三碘化锡(MASnI3)薄膜,并在保持 SnI2 厚度不变的情况下,通过改变 MAI 厚度和退火时间对薄膜进行了优化。薄膜的结晶度随着 MAI 厚度和退火时间的增加而增加。退火 20 & 40 分钟后,500 nm MAI 的薄膜达到了最佳带隙。FE-SEM 显示了密集的大晶粒,其大小随 MAI 厚度和退火时间(0 至 40 分钟)的增加而增加,并在 80 分钟时减小。MAI 厚度为 300 nm、退火时间为 40 分钟的薄膜显示出最强的 PL 强度,表明载流子重组损耗减少。俘获密度随着退火时间和 MAI 厚度的增加而降低,这是由于薄膜的结晶度、晶粒尺寸和作为载流子俘获位点的晶界减少而导致的。因此,通过 SPVD 制备的薄膜具有出色的结构、光学和形态特性,适合光伏应用。
Characterization of methylammonium tin iodide thin films prepared by sequential physical vapour deposition
Methylammonium tin triiodide (MASnI3) films were grown through Sequential Physical Vapour Deposition (SPVD) without breaking the vacuum and optimized by varying MAI thickness and annealing time while keeping SnI2 thickness constant. The film's crystallinity increased with MAI thickness and annealing time. Optimal bandgap was attained for the film with 500 nm MAI annealed for 20 & 40 min. FE-SEM revealed densely packed, large grains, increasing in size with MAI thickness and on annealing from 0 to 40 min and decreasing at 80 min. The film with 300 nm MAI thickness annealed for 40 min showed the strongest PL intensity suggesting reduced carrier recombination losses. Trap densities reduced with annealing time and MAI thickness due to improvements in films' crystallinity, grain sizes and reduced grain boundaries which act as carrier trapping sites. Hence, films prepared through SPVD, exhibit excellent structural, optical, and morphological properties, suitable for photovoltaic applications.
期刊介绍:
Physica B: Condensed Matter comprises all condensed matter and material physics that involve theoretical, computational and experimental work.
Papers should contain further developments and a proper discussion on the physics of experimental or theoretical results in one of the following areas:
-Magnetism
-Materials physics
-Nanostructures and nanomaterials
-Optics and optical materials
-Quantum materials
-Semiconductors
-Strongly correlated systems
-Superconductivity
-Surfaces and interfaces