{"title":"技术压力还是对技术压力源的反应？双语技术压力指数（TSI-II）和加拿大法律专业人员技术压力二阶形成模型的验证","authors":"Nathalie Cadieux , Audrée Bethsa Camille , Jean Cadieux , Marie-Michelle Gouin , Éveline Morin , Pierre-Luc Fournier","doi":"10.1016/j.chbr.2024.100485","DOIUrl":null,"url":null,"abstract":"<div><p>Technostress is a phenomenon that needs to be seen as a process rather than a result. This requires the adaptation of measurement tools accordingly. Legal professionals are particularly exposed to technostress. This paper presents the validation of the TSI-II, an updated and bilingual version of the Techno-Stressors Index (TSI). This updated instrument was tested (French-n = 35; English-n = 30) and then retested (Overall-n = 4482; FR-n<sub>1</sub> = 544; ENG-n<sub>2</sub> = 3938) in both languages among Canadian legal professionals. Using the TSI-II, this paper proposes a second-order formative model of techno-distress, including seven techno-stressors, which captures the recent developments associated with the evolution of the technostress literature. Following the best practices for scale development, TSI-II presents excellent properties and is a good predictor of perceived stress among legal professionals. This validation aligns with developments in technostress literature, namely, the conceptual evolution of techno-distress as a component of the technostress process.</p></div>","PeriodicalId":72681,"journal":{"name":"Computers in human behavior reports","volume":"16 ","pages":"Article 100485"},"PeriodicalIF":4.9000,"publicationDate":"2024-09-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2451958824001180/pdfft?md5=522b892057da566937d04e92ec9cf8e0&pid=1-s2.0-S2451958824001180-main.pdf","citationCount":"0","resultStr":"{\"title\":\"Technostress or reaction to techno-stressors? Validation of bilingual techno-stressors index (TSI-II) and a second-order formative model of techno-distress among Canadian legal professionals\",\"authors\":\"Nathalie Cadieux , Audrée Bethsa Camille , Jean Cadieux , Marie-Michelle Gouin , Éveline Morin , Pierre-Luc Fournier\",\"doi\":\"10.1016/j.chbr.2024.100485\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Technostress is a phenomenon that needs to be seen as a process rather than a result. This requires the adaptation of measurement tools accordingly. Legal professionals are particularly exposed to technostress. This paper presents the validation of the TSI-II, an updated and bilingual version of the Techno-Stressors Index (TSI). This updated instrument was tested (French-n = 35; English-n = 30) and then retested (Overall-n = 4482; FR-n<sub>1</sub> = 544; ENG-n<sub>2</sub> = 3938) in both languages among Canadian legal professionals. Using the TSI-II, this paper proposes a second-order formative model of techno-distress, including seven techno-stressors, which captures the recent developments associated with the evolution of the technostress literature. Following the best practices for scale development, TSI-II presents excellent properties and is a good predictor of perceived stress among legal professionals. This validation aligns with developments in technostress literature, namely, the conceptual evolution of techno-distress as a component of the technostress process.</p></div>\",\"PeriodicalId\":72681,\"journal\":{\"name\":\"Computers in human behavior reports\",\"volume\":\"16 \",\"pages\":\"Article 100485\"},\"PeriodicalIF\":4.9000,\"publicationDate\":\"2024-09-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://www.sciencedirect.com/science/article/pii/S2451958824001180/pdfft?md5=522b892057da566937d04e92ec9cf8e0&pid=1-s2.0-S2451958824001180-main.pdf\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Computers in human behavior reports\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S2451958824001180\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"PSYCHOLOGY, EXPERIMENTAL\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Computers in human behavior reports","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2451958824001180","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"PSYCHOLOGY, EXPERIMENTAL","Score":null,"Total":0}
Technostress or reaction to techno-stressors? Validation of bilingual techno-stressors index (TSI-II) and a second-order formative model of techno-distress among Canadian legal professionals
Technostress is a phenomenon that needs to be seen as a process rather than a result. This requires the adaptation of measurement tools accordingly. Legal professionals are particularly exposed to technostress. This paper presents the validation of the TSI-II, an updated and bilingual version of the Techno-Stressors Index (TSI). This updated instrument was tested (French-n = 35; English-n = 30) and then retested (Overall-n = 4482; FR-n1 = 544; ENG-n2 = 3938) in both languages among Canadian legal professionals. Using the TSI-II, this paper proposes a second-order formative model of techno-distress, including seven techno-stressors, which captures the recent developments associated with the evolution of the technostress literature. Following the best practices for scale development, TSI-II presents excellent properties and is a good predictor of perceived stress among legal professionals. This validation aligns with developments in technostress literature, namely, the conceptual evolution of techno-distress as a component of the technostress process.
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