脉冲频率对 HiPIMS 沉积的 Ti-Al-Ta-N 涂层的结构、机械和摩擦学特性的影响

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
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引用次数: 0

摘要

柱状微结构会大大降低通过物理气相沉积获得的 Ti-Al-Ta-N 涂层的性能。目前的工作重点是研究利用短脉冲高功率脉冲磁控溅射(HiPIMS)阻止 Ti-Al-Ta-N 涂层中柱状晶粒生长的可能性。改变脉冲长度的方法是在 10 % 的恒定占空比下将脉冲频率 f 从 0.5 kHz 变为 10 kHz。这导致脉冲长度从 200 μs 减小到 10 μs。研究发现,脉冲频率会影响磁控管放电的参数和基片上的离子通量。与较低频率(0.5 和 1 kHz)的 HiPIMS 过程相比,以较高脉冲频率(2-10 kHz)实现的短脉冲 HiPIMS 增加了到达基底的离子通量。增加的离子通量轰击生长中的涂层,导致其微观结构从 f < 2 kHz 时观察到的开放式柱状结构演变为 f ≥ 2 kHz 时仅包含小柱状碎片的致密微观结构。微观结构的改变提高了在 f ≥ 2 kHz 时获得的 Ti-Al-Ta-N 涂层的机械性能和耐磨性。在 5 kHz 下沉积的涂层具有最高的硬度和耐磨性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of the pulse frequency on the structure, mechanical and tribological properties of Ti-Al-Ta-N coatings deposited by HiPIMS

Columnar microstructure significantly deteriorates performance of Ti-Al-Ta-N coatings obtained by physical vapor deposition. The present work is focused on studying the possibility to hinder the growth of columnar grains in the Ti-Al-Ta-N coatings using short-pulse high-power impulse magnetron sputtering (HiPIMS). The change of the pulse length is carried out by varying the pulse frequency f from 0.5 to 10 kHz at a constant duty cycle of 10 %. This results in decreasing the pulse length from 200 to 10 μs. It is found that the pulse frequency affects the parameters of magnetron discharge and ion flux at the substrate. Short-pulse HiPIMS realized at higher pulse frequencies (2–10 kHz) provides an increase in the ion flux arriving at the substrate compared to the HiPIMS processes at lower frequencies (0.5 and 1 kHz). The increased ion flux bombarding the growing coatings leads to evolution of their microstructure from the open columnar structure observed at f < 2 kHz to the dense microstructure containing only small columnar fragments at f ≥ 2 kHz. The microstructure modification provides improved mechanical properties and wear resistance of the Ti-Al-Ta-N coatings obtained at f ≥ 2 kHz. The maximum hardness and wear resistance were found in the coating deposited at 5 kHz.

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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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