{"title":"通过溅射条件定制的钆钴合金薄膜的磁性能","authors":"","doi":"10.1016/j.cap.2024.09.006","DOIUrl":null,"url":null,"abstract":"<div><p>The unique properties of ferrimagnets including easy detection of their dynamic and static states, strong resistance to external disturbances, and rapid dynamic characteristics, have made them attractive in the spintronics community. Our study focuses on the engineering of these magnetic properties of ferrimagnets, particularly employing a GdFeCo alloy, a prominent ferrimagnetic material, by utilizing magnetron sputtering. A series of GdFeCo films are fabricated by altering their thicknesses and working pressure during the sputtering process. Our experimental results reveal that these sputtering parameters significantly influence a Gd composition within the films, which in turn affects critical properties of ferrimagnets such as magnetic anisotropy, and magnetic moment compensation temperature. By precisely controlling these sputtering parameters, we successfully tailored the magnetic properties of the GdFeCo thin films with desired properties, offering new possibilities for the creation of sophisticated magnetic materials tailored to specific technological needs.</p></div>","PeriodicalId":11037,"journal":{"name":"Current Applied Physics","volume":null,"pages":null},"PeriodicalIF":2.4000,"publicationDate":"2024-09-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Magnetic properties of GdFeCo thin films tailored by sputtering conditions\",\"authors\":\"\",\"doi\":\"10.1016/j.cap.2024.09.006\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>The unique properties of ferrimagnets including easy detection of their dynamic and static states, strong resistance to external disturbances, and rapid dynamic characteristics, have made them attractive in the spintronics community. Our study focuses on the engineering of these magnetic properties of ferrimagnets, particularly employing a GdFeCo alloy, a prominent ferrimagnetic material, by utilizing magnetron sputtering. A series of GdFeCo films are fabricated by altering their thicknesses and working pressure during the sputtering process. Our experimental results reveal that these sputtering parameters significantly influence a Gd composition within the films, which in turn affects critical properties of ferrimagnets such as magnetic anisotropy, and magnetic moment compensation temperature. By precisely controlling these sputtering parameters, we successfully tailored the magnetic properties of the GdFeCo thin films with desired properties, offering new possibilities for the creation of sophisticated magnetic materials tailored to specific technological needs.</p></div>\",\"PeriodicalId\":11037,\"journal\":{\"name\":\"Current Applied Physics\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":2.4000,\"publicationDate\":\"2024-09-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Current Applied Physics\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S1567173924002062\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Current Applied Physics","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1567173924002062","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
Magnetic properties of GdFeCo thin films tailored by sputtering conditions
The unique properties of ferrimagnets including easy detection of their dynamic and static states, strong resistance to external disturbances, and rapid dynamic characteristics, have made them attractive in the spintronics community. Our study focuses on the engineering of these magnetic properties of ferrimagnets, particularly employing a GdFeCo alloy, a prominent ferrimagnetic material, by utilizing magnetron sputtering. A series of GdFeCo films are fabricated by altering their thicknesses and working pressure during the sputtering process. Our experimental results reveal that these sputtering parameters significantly influence a Gd composition within the films, which in turn affects critical properties of ferrimagnets such as magnetic anisotropy, and magnetic moment compensation temperature. By precisely controlling these sputtering parameters, we successfully tailored the magnetic properties of the GdFeCo thin films with desired properties, offering new possibilities for the creation of sophisticated magnetic materials tailored to specific technological needs.
期刊介绍：
Current Applied Physics (Curr. Appl. Phys.) is a monthly published international journal covering all the fields of applied science investigating the physics of the advanced materials for future applications.
Other areas covered: Experimental and theoretical aspects of advanced materials and devices dealing with synthesis or structural chemistry, physical and electronic properties, photonics, engineering applications, and uniquely pertinent measurement or analytical techniques.
Current Applied Physics, published since 2001, covers physics, chemistry and materials science, including bio-materials, with their engineering aspects. It is a truly interdisciplinary journal opening a forum for scientists of all related fields, a unique point of the journal discriminating it from other worldwide and/or Pacific Rim applied physics journals.
Regular research papers, letters and review articles with contents meeting the scope of the journal will be considered for publication after peer review.
The Journal is owned by the Korean Physical Society.
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
