基于能隙内中间带的产生,Pd2+ 和 Sn4+ 共掺杂 ZnO 纳米片对高性能肖特基二极管的影响

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Elsayed Elgazzar
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引用次数: 0

摘要

钯:锡/氧化锌纳米杂化物是通过化学共沉淀路线制备的,并使用 XRD、EDX、SEM 和 TEM 技术进行了鉴定。微观结构分析表明,钯和锡离子在 ZnO 框架内取代形成了纳米复合材料的多晶性质。表面形貌呈现出具有较大比表面积的二维纳米片。通过波长范围为 300-1400 nm 的 T% 和 R% 光谱,推导出了包括 Eg、n 和 k 在内的光学参数。薄膜在紫外区表现出强烈的光吸收,Eg = 3.10 eV。利用热蒸发技术制作了 Ag/Pd:Sn/ZnO/p-Si/Al 肖特基二极管,并通过 I-V 和 C-V 测量研究了其电子和光电探测器特性。在光照影响下,该光电二极管表现出很高的光敏度和响应度,这归功于大量的光诱导电荷载流子。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Impact of Pd2+ and Sn4+ co-doping ZnO nanoflakes toward high-performing Schottky diode based on the generation of intermediate bands within the energy gap

Impact of Pd2+ and Sn4+ co-doping ZnO nanoflakes toward high-performing Schottky diode based on the generation of intermediate bands within the energy gap

Pd:Sn/ZnO nanohybrid was prepared by chemical co-precipitation route and identified using XRD, EDX, SEM, and TEM techniques. The microstructure analysis emphasized the polycrystalline nature in which Pd and Sn ions were substituted inside ZnO framework to form the nanocomposite. The surface morphology was appeared in 2D nanoflakes with large specific surface area. The optical parameters including Eg, n, and k were deduced from T% and R% spectra through wavelength range 300–1400 nm. The thin film showed strong optical absorption inside the UV region with a value of Eg = 3.10 eV. The Ag/Pd:Sn/ZnO/p-Si/Al Schottky diode was fabricated by thermal evaporation technique, and its electronic and photodetector properties were investigated from I–V and C–V measurements. The fabricated device exhibited non-ideal behavior with high rectification ratio RR = 935 and a relatively small Rs lies between 2365 and 2755 Ω. Under illumination impacts, the photodiode exhibited high photosensitivity and responsivity attributed to the large photo-induced charge carriers.

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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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