4H-SiC 和 2H-GaN 对原子序数为 12 至 15 的低速 〈 0001〉 沟道离子的电子阻挡力比较

IF 1.5 4区 物理与天体物理 Q3 PHYSICS, APPLIED
Kazuhiro Mochizuki, Tomoaki Nishimura, Tomoyoshi Mishima
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引用次数: 0

摘要

用修正的 El-Hoshy-Gibbons 模型再现了 4H-SiC 和 2H-GaN 对低速 12Mg、13Al 和 15P 离子沿〈0001〉方向的电子阻挡力(Se),该模型不仅减少了射弹和目标的原子序数,还减少了 Firsov 模型中小角碰撞的碰撞参数(基于射弹的 Kohn-Sham 半径)。根据预测,低速 14Si 离子的 2H-GaN 的未报告 Se 值介于 12Mg 离子的 2H-GaN 的 Se 值和 13Al 离子的 4H-SiC 的 Se 值之间,这表明不仅 Al 和 Mg,而且 Si 沟道也可用于制造具有成本效益的超级结。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Comparison of electronic stopping powers of 4H-SiC and 2H-GaN for low-velocity 〈0001〉 channeled ions with atomic numbers of 12 to 15
Measured electronic stopping powers along the 〈0001〉 direction (S e) of 4H-SiC and 2H-GaN for low-velocity 12Mg, 13Al, and 15P ions were reproduced with the modified El-Hoshy−Gibbons model that reduced not only the atomic numbers of projectiles and targets but also the impact parameter for small-angle collisions (based on the Kohn−Sham radii of projectiles) in the Firsov model. Unreported S e of 2H-GaN for low-velocity 14Si ions was then predicted to be between S e of 2H-GaN for 12Mg ions and S e of 4H-SiC for 13Al ions, indicating not only Al and Mg but also Si channeling being usable for fabricating cost-effective superjunctions.
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来源期刊
Japanese Journal of Applied Physics
Japanese Journal of Applied Physics 物理-物理:应用
CiteScore
3.00
自引率
26.70%
发文量
818
审稿时长
3.5 months
期刊介绍: The Japanese Journal of Applied Physics (JJAP) is an international journal for the advancement and dissemination of knowledge in all fields of applied physics. JJAP is a sister journal of the Applied Physics Express (APEX) and is published by IOP Publishing Ltd on behalf of the Japan Society of Applied Physics (JSAP). JJAP publishes articles that significantly contribute to the advancements in the applications of physical principles as well as in the understanding of physics in view of particular applications in mind. Subjects covered by JJAP include the following fields: • Semiconductors, dielectrics, and organic materials • Photonics, quantum electronics, optics, and spectroscopy • Spintronics, superconductivity, and strongly correlated materials • Device physics including quantum information processing • Physics-based circuits and systems • Nanoscale science and technology • Crystal growth, surfaces, interfaces, thin films, and bulk materials • Plasmas, applied atomic and molecular physics, and applied nuclear physics • Device processing, fabrication and measurement technologies, and instrumentation • Cross-disciplinary areas such as bioelectronics/photonics, biosensing, environmental/energy technologies, and MEMS
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