{"title":"冰醋酸对 WO3 光催化材料的合成和性能的影响","authors":"Ping’an Huang, Xin Yang, Weihao Wu, Suna Zhang, Xiangrong Zhu, Luping Zhu","doi":"10.1007/s10854-024-13425-3","DOIUrl":null,"url":null,"abstract":"<div><p>WO<sub>3</sub> with different morphologies and structures was prepared via a simple hydrothermal process. The synthesized samples were characterized via different techniques. The effect of the amount of glacial acetic acid added to the precursor solution on the morphology and structure of WO<sub>3</sub> samples was investigated. The amount of glacial acetic acid added was confirmed to be a key parameter in regulating the morphology and microstructure of WO<sub>3</sub>. The photocatalytic activities of the samples have been examined by the degradation of the model pollutant. The WO<sub>3</sub> samples (WO<sub>3</sub>-20) with {001} facet orientation prepared in the presence of 20 mL glacial acetic acid showed a degradation rate of 96.16% for Rhodamine-B (RhB) within 40 min. The excellent performance should be attributed to its low band gap, high light absorption, excellent electron–hole separation efficiency, preferred orientation growth, and unique morphology. The results of quenching and capture experiments showed that the contribution order of different active species in the photocatalytic process is: ·O<sub>2</sub><sup>−</sup> > ·OH > h<sup>+</sup>. In addition, the photocatalytic activity of the WO<sub>3</sub>-20 samples showed slight loses after four cycles, displaying high stability and good recycling performance.</p></div>","PeriodicalId":646,"journal":{"name":"Journal of Materials Science: Materials in Electronics","volume":null,"pages":null},"PeriodicalIF":2.8000,"publicationDate":"2024-08-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Influence of glacial acetic acid on the synthesis and performance of WO3 photocatalytic materials\",\"authors\":\"Ping’an Huang, Xin Yang, Weihao Wu, Suna Zhang, Xiangrong Zhu, Luping Zhu\",\"doi\":\"10.1007/s10854-024-13425-3\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>WO<sub>3</sub> with different morphologies and structures was prepared via a simple hydrothermal process. The synthesized samples were characterized via different techniques. The effect of the amount of glacial acetic acid added to the precursor solution on the morphology and structure of WO<sub>3</sub> samples was investigated. The amount of glacial acetic acid added was confirmed to be a key parameter in regulating the morphology and microstructure of WO<sub>3</sub>. The photocatalytic activities of the samples have been examined by the degradation of the model pollutant. The WO<sub>3</sub> samples (WO<sub>3</sub>-20) with {001} facet orientation prepared in the presence of 20 mL glacial acetic acid showed a degradation rate of 96.16% for Rhodamine-B (RhB) within 40 min. The excellent performance should be attributed to its low band gap, high light absorption, excellent electron–hole separation efficiency, preferred orientation growth, and unique morphology. The results of quenching and capture experiments showed that the contribution order of different active species in the photocatalytic process is: ·O<sub>2</sub><sup>−</sup> > ·OH > h<sup>+</sup>. In addition, the photocatalytic activity of the WO<sub>3</sub>-20 samples showed slight loses after four cycles, displaying high stability and good recycling performance.</p></div>\",\"PeriodicalId\":646,\"journal\":{\"name\":\"Journal of Materials Science: Materials in Electronics\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":2.8000,\"publicationDate\":\"2024-08-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Materials Science: Materials in Electronics\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s10854-024-13425-3\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Materials Science: Materials in Electronics","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s10854-024-13425-3","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Influence of glacial acetic acid on the synthesis and performance of WO3 photocatalytic materials
WO3 with different morphologies and structures was prepared via a simple hydrothermal process. The synthesized samples were characterized via different techniques. The effect of the amount of glacial acetic acid added to the precursor solution on the morphology and structure of WO3 samples was investigated. The amount of glacial acetic acid added was confirmed to be a key parameter in regulating the morphology and microstructure of WO3. The photocatalytic activities of the samples have been examined by the degradation of the model pollutant. The WO3 samples (WO3-20) with {001} facet orientation prepared in the presence of 20 mL glacial acetic acid showed a degradation rate of 96.16% for Rhodamine-B (RhB) within 40 min. The excellent performance should be attributed to its low band gap, high light absorption, excellent electron–hole separation efficiency, preferred orientation growth, and unique morphology. The results of quenching and capture experiments showed that the contribution order of different active species in the photocatalytic process is: ·O2− > ·OH > h+. In addition, the photocatalytic activity of the WO3-20 samples showed slight loses after four cycles, displaying high stability and good recycling performance.
期刊介绍:
The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.