A. A. Lebedev, D. A. Malevsky, V. V. Kozlovski, M. E. Levinshtein
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引用次数: 0
摘要
摘要 研究了在 23 至 500°C 的宽范围辐照温度 Ti 下用质子辐照 n 型碳化硅的长期(持续)电导弛豫过程。研究首次表明,在 1014 cm-2 的质子辐照下,可以观察到两个 "相互竞争 "的长期电导弛豫过程。这两个过程的特征在很大程度上取决于辐照温度和偏压,在此温度和偏压下,电导率的动态变化被研究出来。在样品上施加相对较小的恒定电压后,持续弛豫过程中的电流下降会被电流的持续增加和稳定状态的建立所取代。这两个过程的时间常数范围都很宽。在室温(Ti = 23°C)下进行辐照时,时间常数从几毫秒到几百秒不等。在高温下辐照样品时,时间常数的范围为毫秒到数百毫秒。施加的偏压越高,电流下降被电流上升取代的速度就越快。本文讨论了所观察到的效应的可能性质。
Persistent Relaxation Processes in Proton-Irradiated 4H-SiC
Abstract
The processes of long-term (persistent) conductivity relaxation in n-type silicon carbide irradiated with protons in a wide range irradiation temperatures Ti from 23 to 500°C are studied. It is shown for the first time that as a result of the proton irradiation with the fluence of 1014 cm–2, two “competing” long-term processes of conductivity relaxation can be observed. The characteristics of both processes significantly depend on the irradiation temperature and bias, at which the dynamics of conductivity changes is studied. After applying a relatively small constant voltage to the sample, the decrease in current during persistent relaxation process is replaced by persistent increase in current and establishing of the steady state. Both processes are characterized by a very wide range of time constants. When irradiation is performed at room temperature (Ti= 23°C), the time constants range from milliseconds to hundreds of seconds. When the samples are irradiated at elevated temperatures, the time constants are in the range from milliseconds to hundreds of milliseconds. The higher the bias applied, the faster the decrease in current is replaced by its increase. The possible nature of the observed effects is discussed.
期刊介绍:
Publishes the most important work in semiconductor research in the countries of the former Soviet Union. Covers semiconductor theory, transport phenomena in semiconductors, optics, magnetooptics, and electrooptics of semiconductors, semiconductor lasers and semiconductor surface physics. The journal features an extensive book review section.