第 13 章.集成电路和微块的密封

IF 0.9 Q3 Engineering
V. L. Lanin, V. A. Emel’yanov, I. B. Petuhov
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引用次数: 0

摘要

摘要 本章讨论了用于集成电路和微块的金属-玻璃和金属-陶瓷封装的设计特点,重点讨论了它们通过焊接和熔接进行密封的过程。使用 ANSYS Mechanical 环境进行的建模显示,在钼金属化的金属陶瓷组件中,引线边界处的内应力很大。为解决这一问题,研究建议修改组件设计,在金属化形成过程中加入斜面,从而使产生的应力分布更加均匀。要实现科瓦真空密封连接,零件必须经过退火处理以降低内应力,焊接温度应仅高于焊料熔点 20-30°C 。焊接前,科瓦零件应镀镍,镀层厚度为 10-15 微米,然后在 950°C 下退火。为防止液相沿 Kovar 晶界渗透,建议使用金或铜锗焊料。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Chapter 13. Sealing of Integrated Circuits and Microblocks

Chapter 13. Sealing of Integrated Circuits and Microblocks

Chapter 13. Sealing of Integrated Circuits and Microblocks

This chapter discusses the design features of metal-glass and metal-ceramic packages for integrated circuits and microblocks, focusing on their hermetic sealing processes through soldering and welding. Modeling performed using the ANSYS Mechanical environment has revealed significant internal stress at the boundary of the lead in metal-ceramic assemblies with molybdenum metallization. To address this, the study proposes modifying the assembly design by incorporating bevels during metallization formation, which promotes a more uniform distribution of the resulting stress. For vacuum-tight joints with Kovar, parts must undergo annealing to decrease internal stress, and soldering should occur at a temperature only 20–30°C above the melting point of the solder. Before soldering, Kovar parts should be nickel-plated with a coating thickness of 10–15 µm and subsequently annealed at 950°C. To prevent the liquid phase from penetrating along the grain boundaries of Kovar, the use of gold or copper-germanium solders is recommended.

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来源期刊
Surface Engineering and Applied Electrochemistry
Surface Engineering and Applied Electrochemistry Engineering-Industrial and Manufacturing Engineering
CiteScore
1.60
自引率
22.20%
发文量
54
期刊介绍: Surface Engineering and Applied Electrochemistry is a journal that publishes original and review articles on theory and applications of electroerosion and electrochemical methods for the treatment of materials; physical and chemical methods for the preparation of macro-, micro-, and nanomaterials and their properties; electrical processes in engineering, chemistry, and methods for the processing of biological products and food; and application electromagnetic fields in biological systems.
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