Paolo Soraci, Renato Pisanti, Rocco Servidio, Alex J. Holte, Ambra Ferrari, Zsolt Demetrovics, Mark D. Griffiths
{"title":"问题社交媒体与智能手机使用、社交恐惧症和自尊之间的关联:结构方程模型分析","authors":"Paolo Soraci, Renato Pisanti, Rocco Servidio, Alex J. Holte, Ambra Ferrari, Zsolt Demetrovics, Mark D. Griffiths","doi":"10.1007/s11469-024-01375-0","DOIUrl":null,"url":null,"abstract":"<p>Social phobia has often been associated with problematic social media use (PSMU) and problematic smartphone use (PSU). Studies have also shown an association between social phobia and self-esteem. However, no studies have analyzed the relationship between social phobia, self-esteem, PSMU, and PSU in an integrated model. The present study hypothesized that social phobia may influence PSMU and PSU through the role of self-esteem. A cross-sectional study comprising 400 Italians (74.75% female) with a mean age of 37.11 years (SD = ± 10.83) participated in the study that included Rosenberg’s Self-Esteem Scale, Bergen Social Media Addiction Scale, Severity Measure for Social Phobia Disorder, and Smartphone Application-Based Addiction Scale. The results indicated direct positive associations between social phobia and both types of problematic technology use (PSMU and PSU). The results also indicated that self-esteem was a partial mediator in this complex relationship, suggesting that excessive technology use could be a way to compensate for low self-esteem among individuals with social phobia. The present study contributes to the understanding of the psychological mechanisms underlying the relationship between social anxiety, self-esteem, and problematic technology use.</p>","PeriodicalId":3,"journal":{"name":"ACS Applied Electronic Materials","volume":null,"pages":null},"PeriodicalIF":4.3000,"publicationDate":"2024-09-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"The Associations Between the Problematic Social Media and Smartphone Use, Social Phobia, and Self-Esteem: A Structural Equation Modeling Analysis\",\"authors\":\"Paolo Soraci, Renato Pisanti, Rocco Servidio, Alex J. Holte, Ambra Ferrari, Zsolt Demetrovics, Mark D. Griffiths\",\"doi\":\"10.1007/s11469-024-01375-0\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p>Social phobia has often been associated with problematic social media use (PSMU) and problematic smartphone use (PSU). Studies have also shown an association between social phobia and self-esteem. However, no studies have analyzed the relationship between social phobia, self-esteem, PSMU, and PSU in an integrated model. The present study hypothesized that social phobia may influence PSMU and PSU through the role of self-esteem. A cross-sectional study comprising 400 Italians (74.75% female) with a mean age of 37.11 years (SD = ± 10.83) participated in the study that included Rosenberg’s Self-Esteem Scale, Bergen Social Media Addiction Scale, Severity Measure for Social Phobia Disorder, and Smartphone Application-Based Addiction Scale. The results indicated direct positive associations between social phobia and both types of problematic technology use (PSMU and PSU). The results also indicated that self-esteem was a partial mediator in this complex relationship, suggesting that excessive technology use could be a way to compensate for low self-esteem among individuals with social phobia. The present study contributes to the understanding of the psychological mechanisms underlying the relationship between social anxiety, self-esteem, and problematic technology use.</p>\",\"PeriodicalId\":3,\"journal\":{\"name\":\"ACS Applied Electronic Materials\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":4.3000,\"publicationDate\":\"2024-09-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ACS Applied Electronic Materials\",\"FirstCategoryId\":\"3\",\"ListUrlMain\":\"https://doi.org/10.1007/s11469-024-01375-0\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Electronic Materials","FirstCategoryId":"3","ListUrlMain":"https://doi.org/10.1007/s11469-024-01375-0","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
The Associations Between the Problematic Social Media and Smartphone Use, Social Phobia, and Self-Esteem: A Structural Equation Modeling Analysis
Social phobia has often been associated with problematic social media use (PSMU) and problematic smartphone use (PSU). Studies have also shown an association between social phobia and self-esteem. However, no studies have analyzed the relationship between social phobia, self-esteem, PSMU, and PSU in an integrated model. The present study hypothesized that social phobia may influence PSMU and PSU through the role of self-esteem. A cross-sectional study comprising 400 Italians (74.75% female) with a mean age of 37.11 years (SD = ± 10.83) participated in the study that included Rosenberg’s Self-Esteem Scale, Bergen Social Media Addiction Scale, Severity Measure for Social Phobia Disorder, and Smartphone Application-Based Addiction Scale. The results indicated direct positive associations between social phobia and both types of problematic technology use (PSMU and PSU). The results also indicated that self-esteem was a partial mediator in this complex relationship, suggesting that excessive technology use could be a way to compensate for low self-esteem among individuals with social phobia. The present study contributes to the understanding of the psychological mechanisms underlying the relationship between social anxiety, self-esteem, and problematic technology use.