硅改性聚氨酯磁流变弹性抛光垫的制备与性能研究

IF 3.7 3区材料科学 Q1 INSTRUMENTS & INSTRUMENTATION

Smart Materials and Structures Pub Date : 2024-09-05 DOI:10.1088/1361-665x/ad74c2

Da Hu, Haotian Long, Jiabin Lu, Huilong Li, Jun Zeng, Qiusheng Yan

{"title":"硅改性聚氨酯磁流变弹性抛光垫的制备与性能研究","authors":"Da Hu, Haotian Long, Jiabin Lu, Huilong Li, Jun Zeng, Qiusheng Yan","doi":"10.1088/1361-665x/ad74c2","DOIUrl":null,"url":null,"abstract":"By employing magnetorheological elastomers (MREs) as polishing pads for chemical mechanical polishing (CMP), the magnetorheological properties are utilized to effectively control the flexible removal of materials in CMP. This study presents a method for preparing a silicon modified polyurethane (SPU)-based MRE polishing pad, aimed at demonstrating improved magnetorheological properties while preserving mechanical properties. The SPU-based MRE polishing pad was synthesized through the copolymerization of hydroxypropyl silicone oil and polyurethane prepolymers, with subsequent evaluation of its mechanical properties and polishing performance. Fourier transform infrared analysis confirmed the successful incorporation of the soft polydimethylsiloxane main chain from organosilicon into the polyurethane main chain, forming a soft segment that intertwines with the polyurethane main chain to create a soft-hard segment crosslinked structure. Comparison to polyurethane (PU)-based MRE, SPU exhibits significantly reduced hardness but improved wear resistance, as well as enhanced resistance to acid and alkali corrosion. Due to the presence of a soft matrix, SPU shows better magnetorheological effects (MR Effects) than PU-based MRE. Under a magnetic field intensity of 845 mT, the MR Effect of PU-based MRE is only 18%, while Si-15.96 and Si-16.79 SPU-based MREs can reach 84% and 110%, respectively. Although the material removal rate (MRR) of single-crystal SiC decreases after polishing with SPU compared to PU-based MRE, a higher surface quality is achieved, and the glazing degree of the polishing pad is significantly reduced. In the magnetic field-assisted polishing of single crystal SiC, the MRR increased by 38.4% when polished with an SPU-based MRE polishing pad, whereas the MRR was only 8.7% when polished with a PU-based MRE polishing pad. This study provides further evidence for the development and application of MRE in CMP.","PeriodicalId":21656,"journal":{"name":"Smart Materials and Structures","volume":"14 1","pages":""},"PeriodicalIF":3.7000,"publicationDate":"2024-09-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Preparation and performance study of silicon modified polyurethane-based magnetorheological elastomeric polishing pad\",\"authors\":\"Da Hu, Haotian Long, Jiabin Lu, Huilong Li, Jun Zeng, Qiusheng Yan\",\"doi\":\"10.1088/1361-665x/ad74c2\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"By employing magnetorheological elastomers (MREs) as polishing pads for chemical mechanical polishing (CMP), the magnetorheological properties are utilized to effectively control the flexible removal of materials in CMP. This study presents a method for preparing a silicon modified polyurethane (SPU)-based MRE polishing pad, aimed at demonstrating improved magnetorheological properties while preserving mechanical properties. The SPU-based MRE polishing pad was synthesized through the copolymerization of hydroxypropyl silicone oil and polyurethane prepolymers, with subsequent evaluation of its mechanical properties and polishing performance. Fourier transform infrared analysis confirmed the successful incorporation of the soft polydimethylsiloxane main chain from organosilicon into the polyurethane main chain, forming a soft segment that intertwines with the polyurethane main chain to create a soft-hard segment crosslinked structure. Comparison to polyurethane (PU)-based MRE, SPU exhibits significantly reduced hardness but improved wear resistance, as well as enhanced resistance to acid and alkali corrosion. Due to the presence of a soft matrix, SPU shows better magnetorheological effects (MR Effects) than PU-based MRE. Under a magnetic field intensity of 845 mT, the MR Effect of PU-based MRE is only 18%, while Si-15.96 and Si-16.79 SPU-based MREs can reach 84% and 110%, respectively. Although the material removal rate (MRR) of single-crystal SiC decreases after polishing with SPU compared to PU-based MRE, a higher surface quality is achieved, and the glazing degree of the polishing pad is significantly reduced. In the magnetic field-assisted polishing of single crystal SiC, the MRR increased by 38.4% when polished with an SPU-based MRE polishing pad, whereas the MRR was only 8.7% when polished with a PU-based MRE polishing pad. This study provides further evidence for the development and application of MRE in CMP.\",\"PeriodicalId\":21656,\"journal\":{\"name\":\"Smart Materials and Structures\",\"volume\":\"14 1\",\"pages\":\"\"},\"PeriodicalIF\":3.7000,\"publicationDate\":\"2024-09-05\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Smart Materials and Structures\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.1088/1361-665x/ad74c2\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"INSTRUMENTS & INSTRUMENTATION\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Smart Materials and Structures","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1088/1361-665x/ad74c2","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"INSTRUMENTS & INSTRUMENTATION","Score":null,"Total":0}

引用次数: 0

摘要

采用磁流变弹性体 (MRE) 作为化学机械抛光 (CMP) 的抛光垫，可利用磁流变特性有效控制 CMP 中材料的柔性去除。本研究介绍了一种制备硅改性聚氨酯（SPU）基 MRE 抛光垫的方法，旨在展示改进的磁流变特性，同时保持机械特性。通过羟丙基硅油和聚氨酯预聚物的共聚合成了基于 SPU 的 MRE 抛光垫，随后对其机械性能和抛光性能进行了评估。傅立叶变换红外分析证实，有机硅的软质聚二甲基硅氧烷主链成功地融入了聚氨酯主链，形成了软质段，与聚氨酯主链交织在一起，形成了软硬段交联结构。与以聚氨酯（PU）为基础的 MRE 相比，SPU 的硬度明显降低，但耐磨性提高，耐酸碱腐蚀性增强。由于存在软基质，SPU 比聚氨酯基 MRE 表现出更好的磁流变效果（MR Effects）。在 845 mT 的磁场强度下，PU 基 MRE 的磁流变效应仅为 18%，而 Si-15.96 和 Si-16.79 SPU 基 MRE 的磁流变效应分别可达 84% 和 110%。虽然与 PU 基 MRE 相比，使用 SPU 抛光后单晶 SiC 的材料去除率 (MRR) 有所下降，但却获得了更高的表面质量，抛光垫的釉化程度也明显降低。在单晶 SiC 的磁场辅助抛光中，使用 SPU 基 MRE 抛光垫抛光时，MRR 提高了 38.4%，而使用 PU 基 MRE 抛光垫抛光时，MRR 仅提高了 8.7%。这项研究为 MRE 在 CMP 中的开发和应用提供了进一步的证据。

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Preparation and performance study of silicon modified polyurethane-based magnetorheological elastomeric polishing pad

By employing magnetorheological elastomers (MREs) as polishing pads for chemical mechanical polishing (CMP), the magnetorheological properties are utilized to effectively control the flexible removal of materials in CMP. This study presents a method for preparing a silicon modified polyurethane (SPU)-based MRE polishing pad, aimed at demonstrating improved magnetorheological properties while preserving mechanical properties. The SPU-based MRE polishing pad was synthesized through the copolymerization of hydroxypropyl silicone oil and polyurethane prepolymers, with subsequent evaluation of its mechanical properties and polishing performance. Fourier transform infrared analysis confirmed the successful incorporation of the soft polydimethylsiloxane main chain from organosilicon into the polyurethane main chain, forming a soft segment that intertwines with the polyurethane main chain to create a soft-hard segment crosslinked structure. Comparison to polyurethane (PU)-based MRE, SPU exhibits significantly reduced hardness but improved wear resistance, as well as enhanced resistance to acid and alkali corrosion. Due to the presence of a soft matrix, SPU shows better magnetorheological effects (MR Effects) than PU-based MRE. Under a magnetic field intensity of 845 mT, the MR Effect of PU-based MRE is only 18%, while Si-15.96 and Si-16.79 SPU-based MREs can reach 84% and 110%, respectively. Although the material removal rate (MRR) of single-crystal SiC decreases after polishing with SPU compared to PU-based MRE, a higher surface quality is achieved, and the glazing degree of the polishing pad is significantly reduced. In the magnetic field-assisted polishing of single crystal SiC, the MRR increased by 38.4% when polished with an SPU-based MRE polishing pad, whereas the MRR was only 8.7% when polished with a PU-based MRE polishing pad. This study provides further evidence for the development and application of MRE in CMP.

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来源期刊

Smart Materials and Structures 工程技术-材料科学：综合

CiteScore

7.50

自引率

12.20%

发文量

317

审稿时长

3 months

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