基于溅射法制备的氮化铝薄膜的高重复性紫外柔性光电探测器

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2024-09-08 DOI:10.1016/j.vacuum.2024.113634

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引用次数: 0

摘要

柔性电子器件可适应各种形状，因此有望在可穿戴系统和多功能智能电子设备中发挥重要作用。通过射频（RF）磁控溅射技术在聚对苯二甲酸乙二醇酯（PET）基底上合成了非晶AlInN薄膜，从而制造出了柔性AlInN紫外线（UV）光电探测器。该器件的灵敏度为 1708，检测率 (D*) 为 3.11 × 107 Jones，在 365 nm 紫外线激发下的光响应令人满意。我们特别对该装置进行了柔性实验，并分析了其光响应特性。在以约 90° 的角度弯曲 100 多次后，该器件的光电流仍保持在原始值的 97%。这些发现证明了 AlInN 薄膜在紫外柔性光电检测方面的潜力，并展示了紫外柔性光电检测器的有效制造策略。

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High repeatability UV flexible photodetector based on AlInN film prepared by sputtering

Flexible electronics are expected to play a vital role in wearable systems and multifunctional smart electronic devices owing to their capacity to conform to various shapes. The amorphous AlInN film was synthesized on a Polyethylene terephthalate (PET) substrate via radio-frequency (RF) magnetron sputtering to fabricate a flexible AlInN ultraviolet (UV) photodetector. The device demonstrates a sensitivity of 1708, a detectivity (D*) of 3.11 × 10⁷ Jones and satisfactory photoresponse under 365 nm UV excitation. In particular, we carried out the flexibility experiments for device and analysis its photoresponse characteristics. After more than 100 times bending at about 90° angle, the photocurrent of the device remains at 97 % of its original value. These findings demonstrate the potential of AlInN films in the UV flexible photodetection and display an effective fabrication strategy for UV flexible photodetectors.

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.