带背面辅助槽的新型直槽横向磁触点之间的真空电弧特性研究

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
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引用次数: 0

摘要

TMF 触点之间真空电弧的运动稳定性对真空开关的分断能力有很大影响。TMF 触点上的槽可有效控制真空电弧的运动,从而提供必要的驱动力。然而,电弧必要的横槽运动会影响其稳定性。本文提出了一种新型直槽横向磁场(SSTMF)触头结构,其背面带有额外的辅助槽,可改善电流分布,避免触头中心出现停滞。对不同位置作用在电弧上的力以及触头之间的磁场分布进行了仿真分析。此外,还在可拆卸真空室中对新型和传统 SSTMF 触头进行了电弧实验。实验后对触点进行了扫描电镜分析。结合仿真和对比实验结果,验证了辅助槽可改善对电弧的控制和驱动效果。这可以为今后的触头设计提供思路和参考,并提高真空断路器的分断性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Study on the vacuum arc characteristics between novel straight slot transverse magnetic contacts with auxiliary slots on the back

The motion stability of the vacuum arc between TMF contacts significantly affects the breaking capacity of vacuum switches. The vacuum arc movement can be effectively controlled by slots on the TMF contacts to provide the necessary driving force. However, the necessary cross-slot movement of the arc affects its stability. In this paper, a novel straight-slot transverse magnetic field (SSTMF) contact structure with additional auxiliary slots on the back is proposed to improve current distribution and avoid stagnation at the contact center. The simulation analysis was conducted on the force acting on the arc at different positions and the magnetic field distribution between the contacts. Additionally, the arcing experiments were performed in a demountable vacuum chamber for both novel and traditional SSTMF contacts. The SEM analyses were carried out for the contacts after the experiments. Combined with simulation and comparative experimental results, it is verified that the auxiliary slots can improve the control and driving effect on the arc. This can provide ideas and references for future contact design and improve the breaking performance of vacuum circuit breakers.

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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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