Resilience analysis of stress corrosion cracking in AISI 4340 steel under varying industrial electrochemical conditions

Stress Corrosion Cracking (SCC) presents a substantial challenge within industries where materials confront both mechanical stresses and corrosive environments. This work comprehensively examines SCC, incorporating the collection and analysis of a diverse dataset. The dataset encompasses pivotal parameters, including time to failure, corrosion rates, and electrochemical data. These parameters are meticulously garnered through Slow Strain Rate Testing on carefully prepared smooth, round tension specimens. The experiments are vigilantly overseen through a condition-based data acquisition and logging system, employing various Potentiostatic loads to mirror real-world electrochemical conditions. This research elucidates the intricate interplay between mechanical stresses, electrochemical processes, and corrosive conditions, rendering crucial insights for industries dependent on material integrity amidst formidable environmental challenges. Findings show that AISI 4340 Steel specimens exposed to a $+400mV$ potential in NS4 solution exhibit an extended time to failure of approximately 7.4 days. Conversely, a $-1200mV$ potential in NS4 accelerates the failure to around 5.24 days. In a $3.5wt\%$ NaCl solution at $0mV$, the time to failure is approximately 5.76 days. On the other hand, an applied potential of $+400mV$ increases the failure time to approximately 6.16 days. And an applied potential of $-1200mV$ accelerates the failure time to approximately 4.77 days. Specifically, the study reflects on structures submerged in water and those buried underground, represented by NS4 (Near Neutral Soil Simulating Solution) and $3.5w.t.\%$ NaCl solutions, simulating real-world corrosive conditions. Through a deeper comprehension of SCC, industries can better anticipate and mitigate the risks associated with material failure in harsh environmental conditions, advancing the safeguarding of critical infrastructures.