Conquering surfactant-induced partial wetting of commercial membrane in membrane distillation through in-situ water flushing

Surfactant-induced wetting impedes the practical implementation of membrane distillation (MD). Addressing this issue demands the development of an effective membrane cleaning strategy that can eliminate surfactants adhering to the membrane surface and restore the membrane hydrophobicity. However, current cleaning methods, such as direct drying and pressurized air backwashing, encounter challenges in thoroughly removing surfactants trapped within the pores while preserving the structural integrity of the membrane. This work presents a refined approach to conquer surfactant-induced wetting in MD by water flushing. Utilizing ultrasonic time domain reflectometry and optical coherence tomography techniques, we identified a critical cleaning depth and showed that the hydrophobicity of a partially wetted membrane can be fully recovered by water flushing when the wetting depth is below the critical threshold. Theoretical models evidenced that in instances of low water temperature and low flow rate conditions, relatively high critical cleaning depths can be realized, thereby expanding the operational scope for achieving complete hydrophobicity recovery. Our results demonstrated the applicability of water flushing to commercial membrane modules without necessitating any modification, emphasizing its substantial potential for advancing MD applications.