钻石和硅的等离子喷射打印

Pranay Doshi;Zhou Li;Fabian Langer;Daniel H. Gutierrez;Niels Benson;Dennis Nordlund;Debbie G. Senesky;Ram P. Gandhiraman
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引用次数: 0

摘要

含有氮、硅和其他第四族空位的金刚石作为用于各种量子应用的单光子源一直受到关注。通常情况下,金刚石是通过外延方法制备的,并通过原位掺杂或离子注入的方法加入所需的空位。在这里,我们使用纳米金刚石墨水通过等离子喷射打印制备金刚石,并通过使用纳米颗粒墨水打印加入硅。印刷金刚石薄膜具有外延生长薄膜常见的所有拉曼、X 射线衍射 (XRD) 和光致发光 (PL) 特性。印刷硅薄膜是晶体状的,当在金刚石上印刷时,硅的加入显示出特征性的硅空位聚光峰。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Plasma Jet Printing of Diamond and Silicon
Diamond with nitrogen, silicon and other group IV vacancies have been receiving attention as single-photon sources for various quantum applications. Typically, diamond is prepared by epitaxial methods and the desired vacancies are incorporated by in situ doping or ion implantation. Here we prepare diamond by plasma jet printing from nanodiamond ink and incorporate silicon also by printing using a nanoparticle ink. Printed diamond films exhibit all the characteristic Raman, X-ray diffraction (XRD) and photoluminescence (PL) features commonly seen in epitaxially-grown films. Printed silicon films are crystalline and when printed on diamond, silicon incorporation shows the characteristic silicon vacancy PL peak.
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