基于三维微纳集成碳纳米管结构的波长红外光响应。

IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Beilstein Journal of Nanotechnology Pub Date : 2024-08-15 eCollection Date: 2024-01-01 DOI:10.3762/bjnano.15.84
Yasameen Al-Mafrachi, Sandeep Yadav, Sascha Preu, Jörg J Schneider, Oktay Yilmazoglu
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引用次数: 0

摘要

我们设计并制造了一种新型三维微纳集成 M 型碳纳米管(CNT)结构。它以垂直排列的碳纳米管阵列为基础,由低密度、主要为双壁的碳纳米管组成,与周围环境有简单的横向外部接触。标准光学光刻技术用于局部调整垂直块结构的宽度。整个传感器系统基于宽带黑体吸收器区域和高电阻热敏电阻区域,只需一个化学气相沉积工艺步骤即可制造完成。热敏电阻的电阻主要由相邻排列的 CNT 的高结点电阻决定。这种结构还具有较低的横向热导率和较高的电阻温度系数(TCR)。这些特性对于具有高电压响应和从红外线(IR)到太赫兹光谱的宽带吸收能力的新型测宽传感器来说非常有利。初步性能评估显示,20 × 20 μm2 器件对红外(980 纳米)吸收的电流和电压响应率分别为 2 mA/W 和 30 V/W。该器件的响应时间极短,仅为 0.15 毫秒,TCR 为 -0.91%/K。这些特性分别凸显了它的高运行速度和响应速度。特别是,该器件在超过 200 °C 的高温下仍能保持出色的热稳定性和可靠的工作性能,从而扩展了其在具有挑战性的环境条件下的潜在用途。这种设计允许利用光学光刻技术进一步实现器件微型化。通过大规模集成技术进行批量生产的独特性能,使其成为实时宽带成像系统的重要组成部分。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Bolometric IR photoresponse based on a 3D micro-nano integrated CNT architecture.

A new 3D micro-nano integrated M-shaped carbon nanotube (CNT) architecture was designed and fabricated. It is based on vertically aligned carbon nanotube arrays composed of low-density, mainly double-walled CNTs with simple lateral external contacts to the surroundings. Standard optical lithography techniques were used to locally tailor the width of the vertical block structure. The complete sensor system, based on a broadband blackbody absorber region and a high-resistance thermistor region, can be fabricated in a single chemical vapor deposition process step. The thermistor resistance is mainly determined by the high junction resistances of the adjacent aligned CNTs. This configuration also provides low lateral thermal conductivity and a high temperature coefficient of resistance (TCR). These properties are advantageous for new bolometric sensors with high voltage responsivity and broadband absorption from the infrared (IR) to the terahertz spectrum. Preliminary performance evaluations have shown current and voltage responsivities of 2 mA/W and 30 V/W, respectively, in response to IR (980 nm) absorption for a 20 × 20 μm2 device. The device exhibits an exceptionally fast response time of ≈0.15 ms, coupled with a TCR of -0.91 %/K. These attributes underscore its high operating speed and responsivity, respectively. In particular, the device maintains excellent thermal stability and reliable operation at elevated temperatures in excess of 200 °C, extending its potential utility in challenging environmental conditions. This design allows for further device miniaturization using optical lithography techniques. Its unique properties for mass production through large-scale integration techniques make it important for real-time broadband imaging systems.

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来源期刊
Beilstein Journal of Nanotechnology
Beilstein Journal of Nanotechnology NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
5.70
自引率
3.20%
发文量
109
审稿时长
2 months
期刊介绍: The Beilstein Journal of Nanotechnology is an international, peer-reviewed, Open Access journal. It provides a unique platform for rapid publication without any charges (free for author and reader) – Platinum Open Access. The content is freely accessible 365 days a year to any user worldwide. Articles are available online immediately upon publication and are publicly archived in all major repositories. In addition, it provides a platform for publishing thematic issues (theme-based collections of articles) on topical issues in nanoscience and nanotechnology. The journal is published and completely funded by the Beilstein-Institut, a non-profit foundation located in Frankfurt am Main, Germany. The editor-in-chief is Professor Thomas Schimmel – Karlsruhe Institute of Technology. He is supported by more than 20 associate editors who are responsible for a particular subject area within the scope of the journal.
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