九种种植体表面的粗糙度和润湿性与表面氧和碳的潜在干扰之间的关系:体外评估。

IF 1.7
Douglas Sampaio, Gustavo Batista Grolli Klein, Sheila Cavalca Cortelli, Jorge Luiz Rosa, Giovani Souza Vieira, Rogério de Lima Romeiro
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引用次数: 0

摘要

目的:评估九种牙科种植体表面的粗糙度和亲水性,同时检测这些表面是否存在污染物碳和氧。此外,该研究还调查了所分析表面的这些特征之间的潜在相关性。材料与方法:分析的表面如下:MI:机加工(车削),Implacil 种植体;TOI:喷砂氧化钛,Implacil 种植体;TOAEI:喷砂氧化钛并酸蚀,Implacil 种植体;ZAED:喷砂氧化锆并酸蚀,DSP 种植体;CPD:磷酸钙涂层,DSP 种植体;XD:XD:经过实验性处理(专利申请中)的 DSP 种植体;DAEHAS:双重酸蚀和羟基磷灰石纳米晶体活化的 SIN 种植体;DAES:双重酸蚀的 SIN 种植体;AMP:通过快速成型技术生产的 Plenum 种植体的未处理表面。亲水性和粗糙度评估分别使用了四个和五个圆盘状试样。粗糙度通过光学轮廓仪和扫描电子显微镜进行评估;亲水性通过无梗水滴技术进行测定;化学分析通过 X 射线光电子能谱进行。数据分析采用了 Kruskal-Wallis、Mann-Whitney 和 Spearman 相关性检验(P < 0.10)。结果:所分析的表面在粗糙度和亲水性方面都存在显著差异(p < 0.001)。粗糙度最高的表面是 AMP,而亲水性最强的是 CPD。MI(r = 0.936,p = 0.009)、ZAED(r = 0.957,p = 0.004)和 DAES(r = 0.964,p = 0.005)的粗糙度和疏水性之间存在相关性。在 CPD 表面观察到的碳浓度低于在其他表面观察到的碳浓度,而氧浓度相似。污染物的存在与粗糙度或亲水性特征之间没有相关性。结论受测表面的粗糙度和亲水性值差异很大。除 CPD 表面外,检测到的碳和氧浓度相当。虽然只有ZAED、DAES和MI表面的粗糙度和亲水性之间存在相关性,但这些相关性不足以确定这两种表面特征之间的因果关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Relationship Between Roughness and Wettability of Nine Types of Implant Surfaces and Potential Interference of Surface Oxygen and Carbon: In Vitro Evaluation.

Purpose: To assess the roughness and hydrophilicity of nine types of dental implant surfaces, examine the presence of contaminants-such as carbon and oxygen-on these surfaces, and explore potential correlations among these characteristics across the analyzed surfaces.

Materials and methods: The analyzed surfaces were as follows: machined (turned) (MI) (Implacil De Bortoli), blasted with titanium (Ti) oxide (TOI) (Implacil De Bortoli), blasted with Ti oxide and acid etched (TOAEI) (Implacil De Bortoli), blasted with zirconia (Zr) and acid etched (ZAED) (DSP Medical), coated with calcium phosphate (CPD) (DSP Medical), subjected to an experimental treatment (patent pending; XD) (DSP Medical), double acid etched and activated with hydroxyapatite nanocrystals (DAEHAS) (S.I.N.), double acid etched (DAES) (S.I.N.), and untreated surface of the Plenum implant (AMP) produced by additive manufacturing (Plenum). Four disc-shaped specimens of each surface type were used in the hydrophilicity analyses, and five disc-shaped specimens of each surface type were used in the roughness analyses. Roughness was evaluated by optical profilometry and scanning electron microscopy, hydrophilicity was determined using the sessile-drop technique, and the chemical analysis was performed using X-ray photoelectron spectroscopy (XPS). The Kruskal-Wallis, Mann-Whitney U, and Spearman correlation tests were employed to analyze the data (P < .10).

Results: Significant differences were observed among the analyzed surfaces in terms of both roughness and hydrophilicity (P < .001). The surface that exhibited the highest roughness was AMP, whereas the greatest hydrophilicity was exhibited by the CPD surface. Correlations between roughness and hydrophobicity were only observed for the MI surface (r = 0.936, P = .009), ZAED surface (r = 0.957, P = .004), and DAES surface (r = 0.964, P = .005). The carbon concentration observed on the CPD surface was lower than that observed on the other surfaces, whereas the oxygen concentrations were similar across all groups. No correlations were observed between the presence of contaminants and the roughness or hydrophilicity characteristics.

Conclusions: The roughness and hydrophilicity values exhibited considerable variation among the tested surfaces. Aside from the CPD surface, comparable concentrations of carbon and oxygen were detected. Although correlations between roughness and hydrophilicity were observed only for the ZAED, DAES, and MI surfaces, these correlations were inadequate to establish a causal relationship between the two surface characteristics.

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