高质量外延压电和铁电沃特齐特 Al1- xScxN 薄膜。

IF 10.7 2区材料科学 Q1 CHEMISTRY, PHYSICAL

Small Methods Pub Date : 2024-08-09 DOI:10.1002/smtd.202400722

Yang Zeng, Yihan Lei, Yanghe Wang, Mingqiang Cheng, Luocheng Liao, Xuyang Wang, Jinxin Ge, Zhenghao Liu, Wenjie Ming, Chao Li, Shuhong Xie, Jiangyu Li, Changjian Li

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引用次数: 0

摘要

压电和铁电沃特盐有望重塑现代微电子技术，因为它们很容易与主流半导体技术集成。掺杂钪的 AlN（Al1- xScxN）因其增强的压电和新兴的铁电特性而备受关注，但常用的溅射法会产生具有高漏电流的多晶 Al1- xScxN 薄膜。本文报告了在蓝宝石和 4H-SiC 基底上进行脉冲激光沉积单晶外延 Al1- xScxN 薄膜的情况。在氧气污染≤0.1%的情况下，纯粹的沃特兹相可保持到 x = 0.3。通过原子尺度显微镜成像，极化估计为 140 µC cm-2，并发现可通过扫描探针进行切换。当 x = 0.3 时，压电系数是未掺杂压电系数的五倍，使其成为高频射频（RF）滤波器和三维非易失性存储器的理想材料。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

High Quality Epitaxial Piezoelectric and Ferroelectric Wurtzite Al1- xScxN Thin Films.

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High Quality Epitaxial Piezoelectric and Ferroelectric Wurtzite Al_1- _xSc_xN Thin Films.

Piezoelectric and ferroelectric wurtzite are promising to reshape modern microelectronics because they can be easily integrated with mainstream semiconductor technology. Sc doped AlN (Al_1- _xSc_xN) has attracted much attention for its enhanced piezoelectric and emerging ferroelectric properties, yet the commonly used sputtering results in polycrystalline Al_1- _xSc_xN films with high leakage current. Here, the pulsed laser deposition of single crystalline epitaxial Al_1- _xSc_xN thin films on sapphire and 4H-SiC substrates is reported. Pure wurtzite phase is maintained up to x = 0.3 with ≤0.1 at% oxygen contamination. Polarization is estimated to be 140 µC cm^-2 via atomic scale microscopy imaging and found to be switchable via a scanning probe. The piezoelectric coefficient is found to be five times of the undoped one when x = 0.3, making it desirable for high-frequency radiofrequency (RF) filters and 3D nonvolatile memories.

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来源期刊

Small Methods Materials Science-General Materials Science

CiteScore

17.40

自引率

1.60%

发文量

347

期刊介绍： Small Methods is a multidisciplinary journal that publishes groundbreaking research on methods relevant to nano- and microscale research. It welcomes contributions from the fields of materials science, biomedical science, chemistry, and physics, showcasing the latest advancements in experimental techniques. With a notable 2022 Impact Factor of 12.4 (Journal Citation Reports, Clarivate Analytics, 2023), Small Methods is recognized for its significant impact on the scientific community. The online ISSN for Small Methods is 2366-9608.