Andrea Padovani, Paolo La Torraca, Jack Strand, Luca Larcher, Alexander L. Shluger
{"title":"电子设备中氧化膜的介电击穿","authors":"Andrea Padovani, Paolo La Torraca, Jack Strand, Luca Larcher, Alexander L. Shluger","doi":"10.1038/s41578-024-00702-0","DOIUrl":null,"url":null,"abstract":"Dielectric breakdown is a sudden and catastrophic increase in the conductivity of an insulator caused by electrical stress. It is one of the major reliability issues in electronic devices using insulating films as gate insulators and in energy and memory capacitors. Despite extensive studies, our understanding of the physical mechanisms driving the breakdown process remains incomplete, and atomistic models describing the dielectric breakdown are controversial. This Review surveys the enormous amount of data and knowledge accumulated from experimental and theoretical studies of dielectric breakdown in different insulating materials, focusing on describing phenomenological models and novel computational approaches. Dielectric breakdown is a major reliability issue in electronic devices. This Review discusses the data and knowledge accumulated from experimental and theoretical studies of dielectric breakdown in different insulating materials, with a focus on phenomenological models and novel computational approaches.","PeriodicalId":19081,"journal":{"name":"Nature Reviews Materials","volume":"9 9","pages":"607-627"},"PeriodicalIF":79.8000,"publicationDate":"2024-08-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Dielectric breakdown of oxide films in electronic devices\",\"authors\":\"Andrea Padovani, Paolo La Torraca, Jack Strand, Luca Larcher, Alexander L. Shluger\",\"doi\":\"10.1038/s41578-024-00702-0\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Dielectric breakdown is a sudden and catastrophic increase in the conductivity of an insulator caused by electrical stress. It is one of the major reliability issues in electronic devices using insulating films as gate insulators and in energy and memory capacitors. Despite extensive studies, our understanding of the physical mechanisms driving the breakdown process remains incomplete, and atomistic models describing the dielectric breakdown are controversial. This Review surveys the enormous amount of data and knowledge accumulated from experimental and theoretical studies of dielectric breakdown in different insulating materials, focusing on describing phenomenological models and novel computational approaches. Dielectric breakdown is a major reliability issue in electronic devices. This Review discusses the data and knowledge accumulated from experimental and theoretical studies of dielectric breakdown in different insulating materials, with a focus on phenomenological models and novel computational approaches.\",\"PeriodicalId\":19081,\"journal\":{\"name\":\"Nature Reviews Materials\",\"volume\":\"9 9\",\"pages\":\"607-627\"},\"PeriodicalIF\":79.8000,\"publicationDate\":\"2024-08-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Nature Reviews Materials\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.nature.com/articles/s41578-024-00702-0\",\"RegionNum\":1,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nature Reviews Materials","FirstCategoryId":"88","ListUrlMain":"https://www.nature.com/articles/s41578-024-00702-0","RegionNum":1,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
Dielectric breakdown of oxide films in electronic devices
Dielectric breakdown is a sudden and catastrophic increase in the conductivity of an insulator caused by electrical stress. It is one of the major reliability issues in electronic devices using insulating films as gate insulators and in energy and memory capacitors. Despite extensive studies, our understanding of the physical mechanisms driving the breakdown process remains incomplete, and atomistic models describing the dielectric breakdown are controversial. This Review surveys the enormous amount of data and knowledge accumulated from experimental and theoretical studies of dielectric breakdown in different insulating materials, focusing on describing phenomenological models and novel computational approaches. Dielectric breakdown is a major reliability issue in electronic devices. This Review discusses the data and knowledge accumulated from experimental and theoretical studies of dielectric breakdown in different insulating materials, with a focus on phenomenological models and novel computational approaches.
期刊介绍:
Nature Reviews Materials is an online-only journal that is published weekly. It covers a wide range of scientific disciplines within materials science. The journal includes Reviews, Perspectives, and Comments.
Nature Reviews Materials focuses on various aspects of materials science, including the making, measuring, modelling, and manufacturing of materials. It examines the entire process of materials science, from laboratory discovery to the development of functional devices.