{"title":"用于扩展碱性 ATR-SEIRAS 研究的硅晶片薄层金刚石涂层†...","authors":"Wencheng Li, Wei-Yi Zhang, Baoxin Ni, Peng Shen, Yu Qiao, Xinchang Wang, Xian-Yin Ma, Wen-Bin Cai, Kun Jiang","doi":"10.1002/cjoc.202400499","DOIUrl":null,"url":null,"abstract":"<div>\n \n <p>Electrochemical attenuated total reflection surface-enhanced infrared absorption spectroscopy (ATR-SEIRAS) plays an important role in deciphering interfacial reaction mechanisms at molecular level. However, the corrosive etching of Si internal reflection element by OH<sup>−</sup> largely impedes reliable SEIRAS measurements in strong alkaline electrolytes. Herein, a dense and chemically inert nanocrystalline diamond (NCD) film is successfully fabricated at a thickness of ~120 nm through hot filament chemical vapor deposition on a micromachined Si wafer to insulate the OH<sup>−</sup> etching. A reversible interfacial water feature without spectral interference of Si-O band is obtained in 1.0 mol·L<sup>–1</sup> KOH on Au/NCD/Si film electrode. Afterwards, electrochemical CO reduction reaction on Cu film electrode is explored in different KOH concentrations ranging from 0.1 to 3.0 mol·L<sup>–1</sup> as a model reaction. A redshift of CO<sub>L</sub> band, as well as its lower intensity but faster depletion kinetics, is noted with increasing electrolyte pH, whereas CO<sub>B</sub> is identified as an inert spectator accumulating on Cu surface. Our present work demonstrates the alkaline resistant feature of diamond/Si composite internal reflection element, which could be a powerful platform to study electrocatalytic reactions in strong alkaline media.</p>\n <p>\n </p>\n </div>","PeriodicalId":151,"journal":{"name":"Chinese Journal of Chemistry","volume":"42 23","pages":"3063-3068"},"PeriodicalIF":5.5000,"publicationDate":"2024-07-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Thin-Layer Diamond Coating on Si Wafer for Extended Alkaline ATR-SEIRAS Investigations†\",\"authors\":\"Wencheng Li, Wei-Yi Zhang, Baoxin Ni, Peng Shen, Yu Qiao, Xinchang Wang, Xian-Yin Ma, Wen-Bin Cai, Kun Jiang\",\"doi\":\"10.1002/cjoc.202400499\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div>\\n \\n <p>Electrochemical attenuated total reflection surface-enhanced infrared absorption spectroscopy (ATR-SEIRAS) plays an important role in deciphering interfacial reaction mechanisms at molecular level. However, the corrosive etching of Si internal reflection element by OH<sup>−</sup> largely impedes reliable SEIRAS measurements in strong alkaline electrolytes. Herein, a dense and chemically inert nanocrystalline diamond (NCD) film is successfully fabricated at a thickness of ~120 nm through hot filament chemical vapor deposition on a micromachined Si wafer to insulate the OH<sup>−</sup> etching. A reversible interfacial water feature without spectral interference of Si-O band is obtained in 1.0 mol·L<sup>–1</sup> KOH on Au/NCD/Si film electrode. Afterwards, electrochemical CO reduction reaction on Cu film electrode is explored in different KOH concentrations ranging from 0.1 to 3.0 mol·L<sup>–1</sup> as a model reaction. A redshift of CO<sub>L</sub> band, as well as its lower intensity but faster depletion kinetics, is noted with increasing electrolyte pH, whereas CO<sub>B</sub> is identified as an inert spectator accumulating on Cu surface. Our present work demonstrates the alkaline resistant feature of diamond/Si composite internal reflection element, which could be a powerful platform to study electrocatalytic reactions in strong alkaline media.</p>\\n <p>\\n </p>\\n </div>\",\"PeriodicalId\":151,\"journal\":{\"name\":\"Chinese Journal of Chemistry\",\"volume\":\"42 23\",\"pages\":\"3063-3068\"},\"PeriodicalIF\":5.5000,\"publicationDate\":\"2024-07-31\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Chinese Journal of Chemistry\",\"FirstCategoryId\":\"92\",\"ListUrlMain\":\"https://onlinelibrary.wiley.com/doi/10.1002/cjoc.202400499\",\"RegionNum\":1,\"RegionCategory\":\"化学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"CHEMISTRY, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Chinese Journal of Chemistry","FirstCategoryId":"92","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/cjoc.202400499","RegionNum":1,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
Thin-Layer Diamond Coating on Si Wafer for Extended Alkaline ATR-SEIRAS Investigations†
Electrochemical attenuated total reflection surface-enhanced infrared absorption spectroscopy (ATR-SEIRAS) plays an important role in deciphering interfacial reaction mechanisms at molecular level. However, the corrosive etching of Si internal reflection element by OH− largely impedes reliable SEIRAS measurements in strong alkaline electrolytes. Herein, a dense and chemically inert nanocrystalline diamond (NCD) film is successfully fabricated at a thickness of ~120 nm through hot filament chemical vapor deposition on a micromachined Si wafer to insulate the OH− etching. A reversible interfacial water feature without spectral interference of Si-O band is obtained in 1.0 mol·L–1 KOH on Au/NCD/Si film electrode. Afterwards, electrochemical CO reduction reaction on Cu film electrode is explored in different KOH concentrations ranging from 0.1 to 3.0 mol·L–1 as a model reaction. A redshift of COL band, as well as its lower intensity but faster depletion kinetics, is noted with increasing electrolyte pH, whereas COB is identified as an inert spectator accumulating on Cu surface. Our present work demonstrates the alkaline resistant feature of diamond/Si composite internal reflection element, which could be a powerful platform to study electrocatalytic reactions in strong alkaline media.
期刊介绍:
The Chinese Journal of Chemistry is an international forum for peer-reviewed original research results in all fields of chemistry. Founded in 1983 under the name Acta Chimica Sinica English Edition and renamed in 1990 as Chinese Journal of Chemistry, the journal publishes a stimulating mixture of Accounts, Full Papers, Notes and Communications in English.