Ni3S2@MoS2 nano-arrays with Mo atomic site as efficient photoanode materials for photoelectrocatalytic inactivation of antibiotic-resistance bacteria and degradation of antibiotic-resistance gene

In this paper, hierarchical ultra-thin core/shell Ni₃S₂@MoS₂ nano-arrays with Mo atomic site grown on nickel foam (Ni₃S₂@MoS₂-NF) were designed and synthesized through the hydrothermal method. When they are tested as photoelectric catalysis electrodes to anti-bacteria, the Ni₃S₂@MoS₂ within core/shell structure exhibits about several times higher rate capability and outstanding cycling stability than traditional photocatalysts. After reacting with water and oxygen, large numbers of extracellular reactive oxygen species on the surface of Ni₃S₂@MoS₂ are observed. These reactive oxygen species can penetrate bacterial cells, resulting in a rapid rise of intracellular reactive oxygen species in a short time. The integrity of the bacterial cell membrane is also destroyed, which can be observed in both scanning and transmission images. The synthetic primer was used to specifically label the gene fragment with antibiotic resistance, which was oxidized and eliminated after the photoelectron catalysis (PEC) reaction, proving that this material for PEC antibacterial can not only kill bacteria. Successful elimination of antibiotic-resistance gene fragments can also be achieved.

Graphical abstract