单层 MoS2 电催化纳米器件的应变调节制氢性能

IF 3.5 4区 化学 Q2 ELECTROCHEMISTRY
Baokang Niu, Ningyu Wang, Ruizhao Shen, Xiaobin Liao, Liqiang Mai
{"title":"单层 MoS2 电催化纳米器件的应变调节制氢性能","authors":"Baokang Niu,&nbsp;Ningyu Wang,&nbsp;Ruizhao Shen,&nbsp;Xiaobin Liao,&nbsp;Liqiang Mai","doi":"10.1002/celc.202400352","DOIUrl":null,"url":null,"abstract":"<p>The integration of flexible micro- and nanodevices plays a pivotal role in investigating stress-enhanced performances and underlying intrinsic mechanisms for two-dimensional materials. This study presents the fabrication of single-crystal flexible devices using monolayer MoS<sub>2</sub> and its catalytic activities for the hydrogen evolution reaction under stress conditions. A metallic conductive layer was deposited on the photoresist surface via magnetron sputtering, overcoming the challenges associated with lithography on insulating substrates using electron beam lithography (EBL). The results demonstrate optimal etch patterns with a metal modification layer thickness of 10.97 nm. Leveraging this flexible device fabrication process, a single-layer MoS<sub>2</sub> single-nanosheet flexible micro/nano device was developed and subsequently strain-modulated (stretched along the zigzag lattice direction with the armchair lattice direction as the axis). A significant enhancement is observed in the electrocatalytic hydrogen evolution performance as the strain increases from 0 % to 0.40 %. Notably, the onset overpotential decreased from 155.6 to 95.7 mV, and the Tafel slope decreased from 175.3 to 98.6 mV dec<sup>−1</sup>. This study provides new insights into the design and performance of strain devices for two-dimensional (2D) monocrystalline/polycrystalline materials.</p>","PeriodicalId":142,"journal":{"name":"ChemElectroChem","volume":"11 16","pages":""},"PeriodicalIF":3.5000,"publicationDate":"2024-07-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/celc.202400352","citationCount":"0","resultStr":"{\"title\":\"Strain-Modulated Hydrogen Production Performance in Monolayer MoS2 Electrocatalysis Nanodevices\",\"authors\":\"Baokang Niu,&nbsp;Ningyu Wang,&nbsp;Ruizhao Shen,&nbsp;Xiaobin Liao,&nbsp;Liqiang Mai\",\"doi\":\"10.1002/celc.202400352\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p>The integration of flexible micro- and nanodevices plays a pivotal role in investigating stress-enhanced performances and underlying intrinsic mechanisms for two-dimensional materials. This study presents the fabrication of single-crystal flexible devices using monolayer MoS<sub>2</sub> and its catalytic activities for the hydrogen evolution reaction under stress conditions. A metallic conductive layer was deposited on the photoresist surface via magnetron sputtering, overcoming the challenges associated with lithography on insulating substrates using electron beam lithography (EBL). The results demonstrate optimal etch patterns with a metal modification layer thickness of 10.97 nm. Leveraging this flexible device fabrication process, a single-layer MoS<sub>2</sub> single-nanosheet flexible micro/nano device was developed and subsequently strain-modulated (stretched along the zigzag lattice direction with the armchair lattice direction as the axis). A significant enhancement is observed in the electrocatalytic hydrogen evolution performance as the strain increases from 0 % to 0.40 %. Notably, the onset overpotential decreased from 155.6 to 95.7 mV, and the Tafel slope decreased from 175.3 to 98.6 mV dec<sup>−1</sup>. This study provides new insights into the design and performance of strain devices for two-dimensional (2D) monocrystalline/polycrystalline materials.</p>\",\"PeriodicalId\":142,\"journal\":{\"name\":\"ChemElectroChem\",\"volume\":\"11 16\",\"pages\":\"\"},\"PeriodicalIF\":3.5000,\"publicationDate\":\"2024-07-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://onlinelibrary.wiley.com/doi/epdf/10.1002/celc.202400352\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ChemElectroChem\",\"FirstCategoryId\":\"92\",\"ListUrlMain\":\"https://onlinelibrary.wiley.com/doi/10.1002/celc.202400352\",\"RegionNum\":4,\"RegionCategory\":\"化学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ELECTROCHEMISTRY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ChemElectroChem","FirstCategoryId":"92","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/celc.202400352","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ELECTROCHEMISTRY","Score":null,"Total":0}
引用次数: 0

摘要

柔性微器件和纳米器件的集成在研究二维材料的应力增强性能和内在机制方面发挥着关键作用。本研究介绍了利用单层 MoS2 制备单晶柔性器件及其在应力条件下对氢进化反应的催化活性。通过磁控溅射在光刻胶表面沉积了一层金属导电层,克服了使用电子束光刻技术(EBL)在绝缘基底上进行光刻的难题。结果表明,金属改性层厚度为 10.97 nm,蚀刻模式最佳。利用这种柔性器件制造工艺,开发出了单层 MoS2 单纳米片柔性微型/纳米器件,并随后进行了应变调制(以扶手椅晶格方向为轴,沿人字形晶格方向拉伸)。当应变从 0 % 增加到 0.40 % 时,电催化氢进化性能明显提高。值得注意的是,起始过电位从 155.6 mV 降至 95.7 mV,塔菲尔斜率从 175.3 mV dec-1 降至 98.6 mV dec-1。这项研究为二维(2D)单晶/多晶材料应变装置的设计和性能提供了新的见解。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Strain-Modulated Hydrogen Production Performance in Monolayer MoS2 Electrocatalysis Nanodevices

Strain-Modulated Hydrogen Production Performance in Monolayer MoS2 Electrocatalysis Nanodevices

Strain-Modulated Hydrogen Production Performance in Monolayer MoS2 Electrocatalysis Nanodevices

The integration of flexible micro- and nanodevices plays a pivotal role in investigating stress-enhanced performances and underlying intrinsic mechanisms for two-dimensional materials. This study presents the fabrication of single-crystal flexible devices using monolayer MoS2 and its catalytic activities for the hydrogen evolution reaction under stress conditions. A metallic conductive layer was deposited on the photoresist surface via magnetron sputtering, overcoming the challenges associated with lithography on insulating substrates using electron beam lithography (EBL). The results demonstrate optimal etch patterns with a metal modification layer thickness of 10.97 nm. Leveraging this flexible device fabrication process, a single-layer MoS2 single-nanosheet flexible micro/nano device was developed and subsequently strain-modulated (stretched along the zigzag lattice direction with the armchair lattice direction as the axis). A significant enhancement is observed in the electrocatalytic hydrogen evolution performance as the strain increases from 0 % to 0.40 %. Notably, the onset overpotential decreased from 155.6 to 95.7 mV, and the Tafel slope decreased from 175.3 to 98.6 mV dec−1. This study provides new insights into the design and performance of strain devices for two-dimensional (2D) monocrystalline/polycrystalline materials.

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来源期刊
ChemElectroChem
ChemElectroChem ELECTROCHEMISTRY-
CiteScore
7.90
自引率
2.50%
发文量
515
审稿时长
1.2 months
期刊介绍: ChemElectroChem is aimed to become a top-ranking electrochemistry journal for primary research papers and critical secondary information from authors across the world. The journal covers the entire scope of pure and applied electrochemistry, the latter encompassing (among others) energy applications, electrochemistry at interfaces (including surfaces), photoelectrochemistry and bioelectrochemistry.
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