通过常压等离子体沉积环硅氮烷实现超疏水表面开发

IF 2.9 3区 物理与天体物理 Q2 PHYSICS, APPLIED
Camilo Rendon Piedrahita, Kamal Baba, Robert Quintana, Patrick Choquet
{"title":"通过常压等离子体沉积环硅氮烷实现超疏水表面开发","authors":"Camilo Rendon Piedrahita, Kamal Baba, Robert Quintana, Patrick Choquet","doi":"10.1002/ppap.202400097","DOIUrl":null,"url":null,"abstract":"1,2,3,4,5,6,7,8‐Octamethylcyclotetrasilazane (OTMSD), a cyclic silazane precursor, is deposited via atmospheric pressure plasma onto a substrate. The resulting coating exhibits a dual surface roughness, contributing to a significant reduction of surface wettability. Notably, the coating exhibits superhydrophobic characteristics, proven by a water contact angle of approximately 170°, hysteresis angle below 10°, very low tilting angle (<10°), and droplet‐bouncing effect. Importantly, this superhydrophobicity is achieved using OTMSD as fluorine‐free precursor with low reactivity to water. Furthermore, the deposition process is carried out using a commercially available plasma device highlighting its practicality and scalability for large‐scale production.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":null,"pages":null},"PeriodicalIF":2.9000,"publicationDate":"2024-07-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Superhydrophobic surface development via atmospheric pressure plasma deposition of cyclic silazane\",\"authors\":\"Camilo Rendon Piedrahita, Kamal Baba, Robert Quintana, Patrick Choquet\",\"doi\":\"10.1002/ppap.202400097\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"1,2,3,4,5,6,7,8‐Octamethylcyclotetrasilazane (OTMSD), a cyclic silazane precursor, is deposited via atmospheric pressure plasma onto a substrate. The resulting coating exhibits a dual surface roughness, contributing to a significant reduction of surface wettability. Notably, the coating exhibits superhydrophobic characteristics, proven by a water contact angle of approximately 170°, hysteresis angle below 10°, very low tilting angle (<10°), and droplet‐bouncing effect. Importantly, this superhydrophobicity is achieved using OTMSD as fluorine‐free precursor with low reactivity to water. Furthermore, the deposition process is carried out using a commercially available plasma device highlighting its practicality and scalability for large‐scale production.\",\"PeriodicalId\":20135,\"journal\":{\"name\":\"Plasma Processes and Polymers\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":2.9000,\"publicationDate\":\"2024-07-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Plasma Processes and Polymers\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.1002/ppap.202400097\",\"RegionNum\":3,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"PHYSICS, APPLIED\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Plasma Processes and Polymers","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1002/ppap.202400097","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
引用次数: 0

摘要

1,2,3,4,5,6,7,8-八甲基环四硅氮烷 (OTMSD) 是一种环状硅氮烷前体,通过常压等离子体沉积到基底上。所得涂层具有双重表面粗糙度,从而显著降低了表面润湿性。值得注意的是,该涂层具有超疏水特性,其水接触角约为 170°,滞后角低于 10°,倾角极低(10°),并具有液滴弹跳效应。重要的是,这种超疏水性是使用对水反应性低的无氟前驱体 OTMSD 实现的。此外,沉积过程是使用市场上可买到的等离子设备进行的,这突出了其实用性和大规模生产的可扩展性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Superhydrophobic surface development via atmospheric pressure plasma deposition of cyclic silazane
1,2,3,4,5,6,7,8‐Octamethylcyclotetrasilazane (OTMSD), a cyclic silazane precursor, is deposited via atmospheric pressure plasma onto a substrate. The resulting coating exhibits a dual surface roughness, contributing to a significant reduction of surface wettability. Notably, the coating exhibits superhydrophobic characteristics, proven by a water contact angle of approximately 170°, hysteresis angle below 10°, very low tilting angle (<10°), and droplet‐bouncing effect. Importantly, this superhydrophobicity is achieved using OTMSD as fluorine‐free precursor with low reactivity to water. Furthermore, the deposition process is carried out using a commercially available plasma device highlighting its practicality and scalability for large‐scale production.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Plasma Processes and Polymers
Plasma Processes and Polymers 物理-高分子科学
CiteScore
6.60
自引率
11.40%
发文量
150
审稿时长
3 months
期刊介绍: Plasma Processes & Polymers focuses on the interdisciplinary field of low temperature plasma science, covering both experimental and theoretical aspects of fundamental and applied research in materials science, physics, chemistry and engineering in the area of plasma sources and plasma-based treatments.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信