带直流接地电极的射频放电中等离子体电位的变化

P. Hiret, Patrik Tognina, E. Faudot, Roland Steiner, Artem M Dmitriev, L. Marot, Ernst Meyer
{"title":"带直流接地电极的射频放电中等离子体电位的变化","authors":"P. Hiret, Patrik Tognina, E. Faudot, Roland Steiner, Artem M Dmitriev, L. Marot, Ernst Meyer","doi":"10.1088/1361-6595/ad6691","DOIUrl":null,"url":null,"abstract":"\n The self-bias voltage Vbias and the plasma potential Vp are the key parameters to control plasma-wall interactions in radio-frequency (RF) asymmetric plasma discharges. Knowing these two parameters allows to monitor the ion energy distribution on the electrode surface. However, in a direct current (DC) coupled plasma, the plasma potential increased to hundreds of volts while no more Vbias developed on the driven electrode. In addition, the plasma potential is strongly impacted by the electrode-wall area ratio. Several analytical or semi-analytical models exist to explain this phenomenon and to approximate the plasma potential, knowing the electrode-wall area ratio considering capacitive sheaths or a combination of resistive and capacitive sheaths. The Vp and several other plasma parameters were investigated experimentally with a Langmuir probe and a Retarding field energy analyser (RFEA) for different electrode/wall area ratios in low-temperature RF plasma. The validity of the models was studied for an extensive range of area ratios with different pressures and RF driving amplitude. Moreover, the presence of strong stochastic heating of the plasma for area ratios below 6 was evidenced by an increased ion flux and an increased electron temperature.","PeriodicalId":508056,"journal":{"name":"Plasma Sources Science and Technology","volume":"116 8","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-07-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Variations of plasma potential in RF discharges with DC-grounded electrode\",\"authors\":\"P. Hiret, Patrik Tognina, E. Faudot, Roland Steiner, Artem M Dmitriev, L. Marot, Ernst Meyer\",\"doi\":\"10.1088/1361-6595/ad6691\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\\n The self-bias voltage Vbias and the plasma potential Vp are the key parameters to control plasma-wall interactions in radio-frequency (RF) asymmetric plasma discharges. Knowing these two parameters allows to monitor the ion energy distribution on the electrode surface. However, in a direct current (DC) coupled plasma, the plasma potential increased to hundreds of volts while no more Vbias developed on the driven electrode. In addition, the plasma potential is strongly impacted by the electrode-wall area ratio. Several analytical or semi-analytical models exist to explain this phenomenon and to approximate the plasma potential, knowing the electrode-wall area ratio considering capacitive sheaths or a combination of resistive and capacitive sheaths. The Vp and several other plasma parameters were investigated experimentally with a Langmuir probe and a Retarding field energy analyser (RFEA) for different electrode/wall area ratios in low-temperature RF plasma. The validity of the models was studied for an extensive range of area ratios with different pressures and RF driving amplitude. Moreover, the presence of strong stochastic heating of the plasma for area ratios below 6 was evidenced by an increased ion flux and an increased electron temperature.\",\"PeriodicalId\":508056,\"journal\":{\"name\":\"Plasma Sources Science and Technology\",\"volume\":\"116 8\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-07-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Plasma Sources Science and Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1088/1361-6595/ad6691\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Plasma Sources Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1088/1361-6595/ad6691","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

自偏压 Vbias 和等离子体电位 Vp 是控制射频(RF)不对称等离子体放电中等离子体与壁相互作用的关键参数。了解了这两个参数,就能监测电极表面的离子能量分布。然而,在直流(DC)耦合等离子体中,等离子体电势增加到数百伏,而驱动电极上却不再产生 Vbias。此外,等离子体电势受电极壁面积比的影响很大。有几种分析或半分析模型可以解释这种现象,并根据电容鞘或电阻鞘和电容鞘组合的电极壁面积比来近似计算等离子体电位。在低温射频等离子体中,使用朗缪尔探针和阻滞场能分析仪(RFEA)对不同电极/壁面积比的 Vp 和其他几个等离子体参数进行了实验研究。在不同压力和射频驱动振幅下,研究了多种面积比模型的有效性。此外,在面积比低于 6 时,等离子体存在强烈的随机加热现象,表现为离子通量增加和电子温度升高。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Variations of plasma potential in RF discharges with DC-grounded electrode
The self-bias voltage Vbias and the plasma potential Vp are the key parameters to control plasma-wall interactions in radio-frequency (RF) asymmetric plasma discharges. Knowing these two parameters allows to monitor the ion energy distribution on the electrode surface. However, in a direct current (DC) coupled plasma, the plasma potential increased to hundreds of volts while no more Vbias developed on the driven electrode. In addition, the plasma potential is strongly impacted by the electrode-wall area ratio. Several analytical or semi-analytical models exist to explain this phenomenon and to approximate the plasma potential, knowing the electrode-wall area ratio considering capacitive sheaths or a combination of resistive and capacitive sheaths. The Vp and several other plasma parameters were investigated experimentally with a Langmuir probe and a Retarding field energy analyser (RFEA) for different electrode/wall area ratios in low-temperature RF plasma. The validity of the models was studied for an extensive range of area ratios with different pressures and RF driving amplitude. Moreover, the presence of strong stochastic heating of the plasma for area ratios below 6 was evidenced by an increased ion flux and an increased electron temperature.
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