{"title":"基于钯栅电极的氢气传感 SOI 无结 FET 研究","authors":"Abhishek Raj, Shashi Kant Sharma","doi":"10.1016/j.mejo.2024.106312","DOIUrl":null,"url":null,"abstract":"<div><p>This study provides a comprehensive investigation on palladium (Pd) gate electrode-based silicon on insulator (SOI) junctionless field-effect transistor (JLFET) for hydrogen gas (H<sub>2</sub>) sensing (Pd–SOI-JLFET). The device has a gate dielectric stack consisting of silicon dioxide (SiO<sub>2</sub>) and hafnium dioxide (HfO<sub>2</sub>). An extensive analysis was conducted to detect and identify the presence of hydrogen gas by examining several electrical characteristics such as drain current (I<sub>DS</sub>), transconductance (g<sub>m</sub>), output conductance (g<sub>d</sub>), energy band diagram (E), gate-to-source capacitance (C<sub>GS</sub>), and surface potential (Φ<sub>s</sub>). Furthermore, a comprehensive investigation was conducted to examine the impact of the presence of H<sub>2</sub> gas and variations in temperature on important parameters associated with the short channel effects (SCEs) including off-state current (I<sub>OFF</sub>), on-state current (I<sub>ON</sub>), subthreshold swing (SS) and threshold voltage (V<sub>th</sub>). In addition, the sensitivity analysis of the off-state current (I<sub>OFF</sub>) by considering process variation effect has been done. Sensitivity is also calculated at various temperatures for the detection of hydrogen gas molecule. At the temperature of 300K, the sensitivity values were obtained as 1.50083, 3.21754, 27.71483, 152.39617 and 2052.8 for pressure values 10<sup>−14</sup> Torr, 10<sup>−13</sup> Torr, 10<sup>−12</sup> Torr, 10<sup>−11</sup> Torr and 10<sup>−10</sup> Torr, respectively. This analysis provides a thorough examination of the performance and efficacy of the Pd–SOI-JLFET hydrogen gas sensor highlighting its potential for a wide range of hydrogen sensing applications.</p></div>","PeriodicalId":49818,"journal":{"name":"Microelectronics Journal","volume":null,"pages":null},"PeriodicalIF":1.9000,"publicationDate":"2024-07-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Investigation on palladium gate electrode-based SOI junctionless FET for hydrogen gas sensing\",\"authors\":\"Abhishek Raj, Shashi Kant Sharma\",\"doi\":\"10.1016/j.mejo.2024.106312\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>This study provides a comprehensive investigation on palladium (Pd) gate electrode-based silicon on insulator (SOI) junctionless field-effect transistor (JLFET) for hydrogen gas (H<sub>2</sub>) sensing (Pd–SOI-JLFET). The device has a gate dielectric stack consisting of silicon dioxide (SiO<sub>2</sub>) and hafnium dioxide (HfO<sub>2</sub>). An extensive analysis was conducted to detect and identify the presence of hydrogen gas by examining several electrical characteristics such as drain current (I<sub>DS</sub>), transconductance (g<sub>m</sub>), output conductance (g<sub>d</sub>), energy band diagram (E), gate-to-source capacitance (C<sub>GS</sub>), and surface potential (Φ<sub>s</sub>). Furthermore, a comprehensive investigation was conducted to examine the impact of the presence of H<sub>2</sub> gas and variations in temperature on important parameters associated with the short channel effects (SCEs) including off-state current (I<sub>OFF</sub>), on-state current (I<sub>ON</sub>), subthreshold swing (SS) and threshold voltage (V<sub>th</sub>). In addition, the sensitivity analysis of the off-state current (I<sub>OFF</sub>) by considering process variation effect has been done. Sensitivity is also calculated at various temperatures for the detection of hydrogen gas molecule. At the temperature of 300K, the sensitivity values were obtained as 1.50083, 3.21754, 27.71483, 152.39617 and 2052.8 for pressure values 10<sup>−14</sup> Torr, 10<sup>−13</sup> Torr, 10<sup>−12</sup> Torr, 10<sup>−11</sup> Torr and 10<sup>−10</sup> Torr, respectively. This analysis provides a thorough examination of the performance and efficacy of the Pd–SOI-JLFET hydrogen gas sensor highlighting its potential for a wide range of hydrogen sensing applications.</p></div>\",\"PeriodicalId\":49818,\"journal\":{\"name\":\"Microelectronics Journal\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":1.9000,\"publicationDate\":\"2024-07-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Microelectronics Journal\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S187923912400016X\",\"RegionNum\":3,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Microelectronics Journal","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S187923912400016X","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Investigation on palladium gate electrode-based SOI junctionless FET for hydrogen gas sensing
This study provides a comprehensive investigation on palladium (Pd) gate electrode-based silicon on insulator (SOI) junctionless field-effect transistor (JLFET) for hydrogen gas (H2) sensing (Pd–SOI-JLFET). The device has a gate dielectric stack consisting of silicon dioxide (SiO2) and hafnium dioxide (HfO2). An extensive analysis was conducted to detect and identify the presence of hydrogen gas by examining several electrical characteristics such as drain current (IDS), transconductance (gm), output conductance (gd), energy band diagram (E), gate-to-source capacitance (CGS), and surface potential (Φs). Furthermore, a comprehensive investigation was conducted to examine the impact of the presence of H2 gas and variations in temperature on important parameters associated with the short channel effects (SCEs) including off-state current (IOFF), on-state current (ION), subthreshold swing (SS) and threshold voltage (Vth). In addition, the sensitivity analysis of the off-state current (IOFF) by considering process variation effect has been done. Sensitivity is also calculated at various temperatures for the detection of hydrogen gas molecule. At the temperature of 300K, the sensitivity values were obtained as 1.50083, 3.21754, 27.71483, 152.39617 and 2052.8 for pressure values 10−14 Torr, 10−13 Torr, 10−12 Torr, 10−11 Torr and 10−10 Torr, respectively. This analysis provides a thorough examination of the performance and efficacy of the Pd–SOI-JLFET hydrogen gas sensor highlighting its potential for a wide range of hydrogen sensing applications.
期刊介绍:
Published since 1969, the Microelectronics Journal is an international forum for the dissemination of research and applications of microelectronic systems, circuits, and emerging technologies. Papers published in the Microelectronics Journal have undergone peer review to ensure originality, relevance, and timeliness. The journal thus provides a worldwide, regular, and comprehensive update on microelectronic circuits and systems.
The Microelectronics Journal invites papers describing significant research and applications in all of the areas listed below. Comprehensive review/survey papers covering recent developments will also be considered. The Microelectronics Journal covers circuits and systems. This topic includes but is not limited to: Analog, digital, mixed, and RF circuits and related design methodologies; Logic, architectural, and system level synthesis; Testing, design for testability, built-in self-test; Area, power, and thermal analysis and design; Mixed-domain simulation and design; Embedded systems; Non-von Neumann computing and related technologies and circuits; Design and test of high complexity systems integration; SoC, NoC, SIP, and NIP design and test; 3-D integration design and analysis; Emerging device technologies and circuits, such as FinFETs, SETs, spintronics, SFQ, MTJ, etc.
Application aspects such as signal and image processing including circuits for cryptography, sensors, and actuators including sensor networks, reliability and quality issues, and economic models are also welcome.