浅水和深水表面的涡旋运动

IF 0.5 Q4 PHYSICS, CONDENSED MATTER
A. V. Poplevin, A. A. Levchenko, A. M. Likhter, S. V. Filatov, L. P. Mezhov-Deglin
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引用次数: 0

摘要

摘要 研究了涡流运动在浅水和深水表面的衰减。涡流是由两个相互垂直的波在频率为 6 Hz(波长 λ = 5.6 cm)的柱塞激发下在面积为 70 × 70 cm、深度为 h 的水面上形成的。在浅水表面,λ/2π ≈ h,当涡旋的特征尺寸 L 超过液体深度 L \( \gg \) h 时,涡旋流能量Е(t) 的时间依赖性在所有泵送水平上都用指数函数来描述,而增焓Ф(t) = Ω2(t)的依赖性仅在波矢 0-0.3 cm-1 的范围内是指数函数。在深水表面,λ/2π < h, L ≈ h,Е(t) 和 Ф(t) 在所有波长范围内都远非指数关系。在高泵送波幅下,Е(t) 和 Ф(t) 的相关性是非单调的,这可能是由于体积流的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Vortex Motion on the Surface of Shallow and Deep Water

Vortex Motion on the Surface of Shallow and Deep Water

Vortex Motion on the Surface of Shallow and Deep Water

The attenuation of vortex motion on the surface of shallow and deep water is investigated. The vortex flow is formed by two mutually perpendicular waves excited by plungers at a frequency of 6 Hz (wavelength λ = 5.6 cm) on the surface of water measuring 70 × 70 cm and depth h. After reaching a stationary state in the vortex system, the wave pumping is switched off and the attenuation of the surface flow is recorded. On the surface of shallow water, λ/2π ≈ h, when the characteristic size of vortices L exceeds the depth of the liquid, L \( \gg \) h, the time dependence of the energy of the vortex flow Е(t) is described by an exponential function at all pumping levels while the dependence of enstrophy Ф(t) = Ω2(t) is exponential only in the range of wave vectors 0–0.3 cm–1. On the surface of deep water, λ/2π < h, Lh the dependences Е(t) and Ф(t) are far from exponential in all wavenumber ranges. At high pumping wave amplitudes, the dependences Е(t) and Ф(t) are nonmonotonic, which can be attributed to the influence of volumetric flows.

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来源期刊
CiteScore
0.90
自引率
25.00%
发文量
144
审稿时长
3-8 weeks
期刊介绍: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
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