{"title":"掺硼和掺氮四面体无定形碳的电化学性能","authors":"","doi":"10.1016/j.electacta.2024.144655","DOIUrl":null,"url":null,"abstract":"<div><p>Tetrahedral amorphous carbon (ta-C) is one of the most versatile carbon electrode materials available. The incorporation of various dopants in ta-C alters the structural, electrochemical, physical, and chemical properties which are tunable for various applications. Furthermore, doped ta-C (ta-C:X) can be deposited on many different substrate materials (metals, ceramics, plastics) and geometries (micro-electrodes to ultra large areas at continuous coating lines). In this work, we present a comparison in electrochemical performance of ta-C electrodes prepared by filtered laser-arc (a physical vapor deposition process), doped with nitrogen (ta-C:N) at various levels, doped by boron (ta-C:B), and doped by boron and nitrogen together (ta-C:B:N). The ta-C:N films were doped via N<sub>2</sub> gas in the deposition chamber, while ta-C:B and ta-C:B:N were deposited via incorporation of the dopant into the graphite cathode used for film synthesis. Films coated on silicon (Si) and titanium (Ti) substrates were compared through cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS). The Fe(CN)<sub>6</sub><sup>3-/4−</sup> and Ru(NH<sub>3</sub>)<sub>6</sub><sup>3+/2+</sup>redox systems were used to investigate the electrochemical characteristics of each ta-C:X film type. Boron-doped diamond (BDD), glassy carbon (GC), and undoped ta-C were used as control electrodes. It was found that all ta-C:X films exhibited appropriate rates of electron transfer, wide working potential window (ca. 3.7 V in KCl), and low capacitance. Specifically, the boronated films produced high heterogenous rate constant (<em>k</em>), the lowest double layer capacitance (C<sub>dl</sub>), and a consequentially smaller RC time constant than BDD and GC. Incorporating boron into undoped and nitrogenated ta-C films stabilizes the formation of sp<sup>3</sup> bonded content during deposition leading to films with a smoother surface and increased hardness. It is shown that the B-incorporated films exhibit no compromise in their electrochemical performance despite the increase in sp<sup>3</sup> content. Due to its versatile nature, ta-C stands out as a material with a wide range of tunable properties for various applications.</p></div>","PeriodicalId":305,"journal":{"name":"Electrochimica Acta","volume":null,"pages":null},"PeriodicalIF":5.5000,"publicationDate":"2024-07-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Electrochemical performance of boron- and nitrogen-doped tetrahedral amorphous carbon\",\"authors\":\"\",\"doi\":\"10.1016/j.electacta.2024.144655\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Tetrahedral amorphous carbon (ta-C) is one of the most versatile carbon electrode materials available. The incorporation of various dopants in ta-C alters the structural, electrochemical, physical, and chemical properties which are tunable for various applications. Furthermore, doped ta-C (ta-C:X) can be deposited on many different substrate materials (metals, ceramics, plastics) and geometries (micro-electrodes to ultra large areas at continuous coating lines). In this work, we present a comparison in electrochemical performance of ta-C electrodes prepared by filtered laser-arc (a physical vapor deposition process), doped with nitrogen (ta-C:N) at various levels, doped by boron (ta-C:B), and doped by boron and nitrogen together (ta-C:B:N). The ta-C:N films were doped via N<sub>2</sub> gas in the deposition chamber, while ta-C:B and ta-C:B:N were deposited via incorporation of the dopant into the graphite cathode used for film synthesis. Films coated on silicon (Si) and titanium (Ti) substrates were compared through cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS). The Fe(CN)<sub>6</sub><sup>3-/4−</sup> and Ru(NH<sub>3</sub>)<sub>6</sub><sup>3+/2+</sup>redox systems were used to investigate the electrochemical characteristics of each ta-C:X film type. Boron-doped diamond (BDD), glassy carbon (GC), and undoped ta-C were used as control electrodes. It was found that all ta-C:X films exhibited appropriate rates of electron transfer, wide working potential window (ca. 3.7 V in KCl), and low capacitance. Specifically, the boronated films produced high heterogenous rate constant (<em>k</em>), the lowest double layer capacitance (C<sub>dl</sub>), and a consequentially smaller RC time constant than BDD and GC. Incorporating boron into undoped and nitrogenated ta-C films stabilizes the formation of sp<sup>3</sup> bonded content during deposition leading to films with a smoother surface and increased hardness. It is shown that the B-incorporated films exhibit no compromise in their electrochemical performance despite the increase in sp<sup>3</sup> content. Due to its versatile nature, ta-C stands out as a material with a wide range of tunable properties for various applications.</p></div>\",\"PeriodicalId\":305,\"journal\":{\"name\":\"Electrochimica Acta\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":5.5000,\"publicationDate\":\"2024-07-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Electrochimica Acta\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0013468624008958\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"ELECTROCHEMISTRY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Electrochimica Acta","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0013468624008958","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ELECTROCHEMISTRY","Score":null,"Total":0}
Electrochemical performance of boron- and nitrogen-doped tetrahedral amorphous carbon
Tetrahedral amorphous carbon (ta-C) is one of the most versatile carbon electrode materials available. The incorporation of various dopants in ta-C alters the structural, electrochemical, physical, and chemical properties which are tunable for various applications. Furthermore, doped ta-C (ta-C:X) can be deposited on many different substrate materials (metals, ceramics, plastics) and geometries (micro-electrodes to ultra large areas at continuous coating lines). In this work, we present a comparison in electrochemical performance of ta-C electrodes prepared by filtered laser-arc (a physical vapor deposition process), doped with nitrogen (ta-C:N) at various levels, doped by boron (ta-C:B), and doped by boron and nitrogen together (ta-C:B:N). The ta-C:N films were doped via N2 gas in the deposition chamber, while ta-C:B and ta-C:B:N were deposited via incorporation of the dopant into the graphite cathode used for film synthesis. Films coated on silicon (Si) and titanium (Ti) substrates were compared through cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS). The Fe(CN)63-/4− and Ru(NH3)63+/2+redox systems were used to investigate the electrochemical characteristics of each ta-C:X film type. Boron-doped diamond (BDD), glassy carbon (GC), and undoped ta-C were used as control electrodes. It was found that all ta-C:X films exhibited appropriate rates of electron transfer, wide working potential window (ca. 3.7 V in KCl), and low capacitance. Specifically, the boronated films produced high heterogenous rate constant (k), the lowest double layer capacitance (Cdl), and a consequentially smaller RC time constant than BDD and GC. Incorporating boron into undoped and nitrogenated ta-C films stabilizes the formation of sp3 bonded content during deposition leading to films with a smoother surface and increased hardness. It is shown that the B-incorporated films exhibit no compromise in their electrochemical performance despite the increase in sp3 content. Due to its versatile nature, ta-C stands out as a material with a wide range of tunable properties for various applications.
期刊介绍:
Electrochimica Acta is an international journal. It is intended for the publication of both original work and reviews in the field of electrochemistry. Electrochemistry should be interpreted to mean any of the research fields covered by the Divisions of the International Society of Electrochemistry listed below, as well as emerging scientific domains covered by ISE New Topics Committee.