通过叔丁氧锆(IV)交替脉冲和水蒸气表面处理法合成的带有氧化锆涂层的各种基质的表面形貌

A. V. Moskalev, V. V. Antipov, A. S. Tsipanova, A. A. Malygin
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引用次数: 0

摘要

通过交替脉冲处理叔丁氧锆和水蒸气,在单晶硅和硼硅玻璃板表面合成了不同厚度的氧化锆涂层。使用原子力显微镜研究了基体类型和涂层厚度对样品表面形态的影响。通过 X 射线光谱显微分析测定了合成产物中的锆浓度,并评估了硅上氧化锆薄膜的生长常数。假设了基体类型对氧化锆层表面结构的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Surface Morphology of Various Matrixes with Zirconium Oxide Coatings Synthetized by Alternating Pulsing of Zirconium(IV) tert-Butoxide and Water Vapors Treatment of the Surface
Zirconium oxide coatings of various thicknesses were synthesized on the surface of plates of monocrystalline silicon and borosilicate glass by alternating pulsing of zirconium(IV) tert-butoxide and water vapors treatment. The effect of the matrix type and the coating thickness on surface morphology of the samples was investigated using atomic force microscopy. The concentrations of zirconium in the synthesis products were determined by X-ray spectral microanalysis and the growth constant of the zirconium oxide film on silicon was evaluated. Assumptions are made about the influence of the type of the matrix on the structure of the surface of the zirconium oxide layer.
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