L. Ribotta, A. Delvallée, E. Cara, Roberto Bellotti, Andrea Giura, Ivan De Carlo, Fretto Matteo, Knulst Walter, R. Koops, Bruno Torre, Z. Saghi, Luca Boarino
{"title":"用于硅纳米线纳米尺寸计量的原子力显微镜实验室间比较","authors":"L. Ribotta, A. Delvallée, E. Cara, Roberto Bellotti, Andrea Giura, Ivan De Carlo, Fretto Matteo, Knulst Walter, R. Koops, Bruno Torre, Z. Saghi, Luca Boarino","doi":"10.1088/1361-6501/ad5e9f","DOIUrl":null,"url":null,"abstract":"\n Silicon nanowires (NWs) with a cylindrical form are fabricated by means of nanospheres lithography and metal-assisted chemical etching to obtain high aspect ratio nanostructures (diameter of about 100 nm and length of more than 15 µm) on cm2 area. The nanodimensional characterization of individual NWs is performed by using several techniques, because dimensions at the nanoscale strictly relate to functional performances. In this study, we report the results of an interlaboratory comparison between measurements from a metrological atomic force microscope (AFM) and research AFMs located in different national metrology institutes (NMIs) across Europe and in a university. The purpose of this study is to characterize two measurands: (i) sidewall roughness (Ra, Rq, Rz, Rsk, Rku parameters), extracted from the top profile measured along the nanowire length, and (ii) diameter of the nanowires measured as top-height. To this goal, the nanowires are spread horizontally on a silicon substrate, which has several areas labelled with a pattern of crosses and letters facilitating the measurement of the same NW, in order to study the reproducibility due to different instruments. Measurements show a good agreement between the different NMIs, with a combined standard uncertainty of top-height diameter less than 3%, and with a combined standard uncertainty of roughness parameters well within 5% for Ra and Rq values.","PeriodicalId":2,"journal":{"name":"ACS Applied Bio Materials","volume":" 46","pages":""},"PeriodicalIF":4.6000,"publicationDate":"2024-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"AFM interlaboratory comparison for nanodimensional metrology on silicon nanowires\",\"authors\":\"L. Ribotta, A. Delvallée, E. Cara, Roberto Bellotti, Andrea Giura, Ivan De Carlo, Fretto Matteo, Knulst Walter, R. Koops, Bruno Torre, Z. Saghi, Luca Boarino\",\"doi\":\"10.1088/1361-6501/ad5e9f\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\\n Silicon nanowires (NWs) with a cylindrical form are fabricated by means of nanospheres lithography and metal-assisted chemical etching to obtain high aspect ratio nanostructures (diameter of about 100 nm and length of more than 15 µm) on cm2 area. The nanodimensional characterization of individual NWs is performed by using several techniques, because dimensions at the nanoscale strictly relate to functional performances. In this study, we report the results of an interlaboratory comparison between measurements from a metrological atomic force microscope (AFM) and research AFMs located in different national metrology institutes (NMIs) across Europe and in a university. The purpose of this study is to characterize two measurands: (i) sidewall roughness (Ra, Rq, Rz, Rsk, Rku parameters), extracted from the top profile measured along the nanowire length, and (ii) diameter of the nanowires measured as top-height. To this goal, the nanowires are spread horizontally on a silicon substrate, which has several areas labelled with a pattern of crosses and letters facilitating the measurement of the same NW, in order to study the reproducibility due to different instruments. Measurements show a good agreement between the different NMIs, with a combined standard uncertainty of top-height diameter less than 3%, and with a combined standard uncertainty of roughness parameters well within 5% for Ra and Rq values.\",\"PeriodicalId\":2,\"journal\":{\"name\":\"ACS Applied Bio Materials\",\"volume\":\" 46\",\"pages\":\"\"},\"PeriodicalIF\":4.6000,\"publicationDate\":\"2024-07-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ACS Applied Bio Materials\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://doi.org/10.1088/1361-6501/ad5e9f\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"MATERIALS SCIENCE, BIOMATERIALS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Bio Materials","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1088/1361-6501/ad5e9f","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, BIOMATERIALS","Score":null,"Total":0}
AFM interlaboratory comparison for nanodimensional metrology on silicon nanowires
Silicon nanowires (NWs) with a cylindrical form are fabricated by means of nanospheres lithography and metal-assisted chemical etching to obtain high aspect ratio nanostructures (diameter of about 100 nm and length of more than 15 µm) on cm2 area. The nanodimensional characterization of individual NWs is performed by using several techniques, because dimensions at the nanoscale strictly relate to functional performances. In this study, we report the results of an interlaboratory comparison between measurements from a metrological atomic force microscope (AFM) and research AFMs located in different national metrology institutes (NMIs) across Europe and in a university. The purpose of this study is to characterize two measurands: (i) sidewall roughness (Ra, Rq, Rz, Rsk, Rku parameters), extracted from the top profile measured along the nanowire length, and (ii) diameter of the nanowires measured as top-height. To this goal, the nanowires are spread horizontally on a silicon substrate, which has several areas labelled with a pattern of crosses and letters facilitating the measurement of the same NW, in order to study the reproducibility due to different instruments. Measurements show a good agreement between the different NMIs, with a combined standard uncertainty of top-height diameter less than 3%, and with a combined standard uncertainty of roughness parameters well within 5% for Ra and Rq values.
期刊介绍:
ACS Applied Bio Materials is an interdisciplinary journal publishing original research covering all aspects of biomaterials and biointerfaces including and beyond the traditional biosensing, biomedical and therapeutic applications.
The journal is devoted to reports of new and original experimental and theoretical research of an applied nature that integrates knowledge in the areas of materials, engineering, physics, bioscience, and chemistry into important bio applications. The journal is specifically interested in work that addresses the relationship between structure and function and assesses the stability and degradation of materials under relevant environmental and biological conditions.