金属有机化学气相沉积法生长的氮化镓中共掺杂铍和镁的掺入与相互作用

B. McEwen, E. Rocco, Vincent Meyers, Alireza Lanjani, Shadi Omranpour, O. Andrieiev, M. Vorobiov, D. Demchenko, M. Reshchikov, F. Shahedipour-Sandvik
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引用次数: 0

摘要

尽管最近在氮化镓:铍的生长和表征方面取得了进展,但可靠的导电 p 型氮化镓:铍仍然遥遥无期。在这项工作中,GaN 与 Be 和 Mg 共同掺杂,以提高 Be 和 Mg 的掺入和电离效率。研究发现,铍和镁以复杂的方式相互作用,使 GaN:Be,Mg 成为半绝缘体。当 Be 和 Mg 作为共掺杂剂时,不但不会提高 Be 和 Mg 的掺入效率,反而会明显地相互抑制掺入。此外,光致发光测量结果表明,相对于总[Be]而言,BeGa 受体的减少尤为明显。镁则没有观察到同样的效应。由此得出的结论是,镁优先于铍掺入镓晶格位点,而不能掺入取代位点的多余铍则占据了间隙位点。间隙铍作为供体缺陷,补偿了镁的受体。这就解释了为什么在[镁]含量较高的氮化镓:铍中观察到与铍相关的发光强度降低(而[铍]含量没有相应降低)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Incorporation and Interaction of Co‐Doped Be and Mg in GaN Grown by Metal‐Organic Chemic Vapor Deposition
Despite recent advances in growth and characterization of GaN:Be, reliable conductive p‐type GaN:Be remains elusive. In this work, GaN is co‐doped with Be and Mg to improve the incorporation and ionization efficiency of both Be and Mg. Be and Mg are found to interact in complex ways rendering GaN:Be,Mg semi‐insulating. Rather than improving Be and Mg incorporation efficiency, there is an apparent mutual inhibition of incorporation when Be and Mg are co‐dopants. Furthermore, photoluminescence measurements indicate that the BeGa acceptor is reduced in particular, relative to the total [Be]. The same effect is not observed for Mg. From this, it is concluded that Mg preferentially incorporates into Ga lattice sites over Be, and excess Be that cannot incorporate into substitutional sites instead occupies interstitial sites. The interstitial Be acts as donor defect, which compensate Mg acceptors. This provides an explanation for the observed reduction in BeGa‐related luminescence intensity (without an associated decrease in [Be]) in GaN:Be with significant [Mg] content.
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