用于液晶设备的纳米/微槽掺锆氧化镧薄膜与自排列分子

IF 1.6 4区 化学 Q4 CHEMISTRY, PHYSICAL
Bo‐Kyeong Choi, J. Oh, Dae-Hyun Kim, Dong Wook Lee, Dae-Shik Seo
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引用次数: 0

摘要

在此,我们提出了一种刷涂掺锆氧化镧(ZrLaO)薄膜作为液晶(LC)配向层。薄膜固化温度分别为 70、150 和 230°C。偏光光学显微镜和预倾斜角分析证实,在 230°C 固化的氧化锆薄膜上,液晶排列均匀一致。原子力显微镜显示,表面具有纳米/微槽结构,这是由于刷涂过程中产生的剪应力造成的。这种结构促使 LC 均匀排列。X 射线光电子能谱验证了 ZrLaO 膜在玻璃基底上的良好成型。ZrLaO 薄膜具有亲水性,其表面能随着固化温度的升高而增加。ZrLaO 配向层具有适合 LC 器件应用的透光率。与传统的聚酰亚胺层相比,基于 ZrLaO 层的扭曲向列液晶电池具有更稳定的开关特性和更好的阈值电压特性。因此,我们预计这种刷涂 ZrLaO 层将成为适用于 LC 器件应用的 LC 配向层。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Nano/microgroove zirconium‐doped lanthanum oxide film with self‐aligned molecules for liquid crystal device application
Herein, we propose a brush‐coated zirconium‐doped lanthanum oxide (ZrLaO) film as a liquid crystal (LC) alignment layer. The film‐curing temperature was adjusted to 70, 150, and 230°C. Polarized optical microscopy and pre‐tilt angle analysis confirmed that there was uniform and homogeneous LC alignment on the 230°C cured ZrLaO film. Atomic force microscopy revealed that the surface had a nano/microgroove structure, which was caused by the shear stress generated by the brush‐coating process. This structure induced the uniform LC alignment. X‐ray photoelectron spectroscopy verified that the ZrLaO film was well‐formed on a glass substrate. The ZrLaO film displayed hydrophilic characteristics, and its surface energy increased as the film‐curing temperature increased. The ZrLaO alignment layer displayed suitable optical transmittance for LC device applications. The ZrLaO layer‐based twisted‐nematic LC cell exhibited more stable switching properties and better threshold voltage characteristics than conventional polyimide layers. Therefore, we expect that this brush‐coated ZrLaO layer will be a suitable LC alignment layer for LC device applications.
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来源期刊
Surface and Interface Analysis
Surface and Interface Analysis 化学-物理化学
CiteScore
3.30
自引率
5.90%
发文量
130
审稿时长
4.4 months
期刊介绍: Surface and Interface Analysis is devoted to the publication of papers dealing with the development and application of techniques for the characterization of surfaces, interfaces and thin films. Papers dealing with standardization and quantification are particularly welcome, and also those which deal with the application of these techniques to industrial problems. Papers dealing with the purely theoretical aspects of the technique will also be considered. Review articles will be published; prior consultation with one of the Editors is advised in these cases. Papers must clearly be of scientific value in the field and will be submitted to two independent referees. Contributions must be in English and must not have been published elsewhere, and authors must agree not to communicate the same material for publication to any other journal. Authors are invited to submit their papers for publication to John Watts (UK only), Jose Sanz (Rest of Europe), John T. Grant (all non-European countries, except Japan) or R. Shimizu (Japan only).
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